发明授权
EP1374277B1 INDUCTIVE PLASMA PROCESSOR INCLUDING CURRENT SENSOR FOR PLASMA EXCITATION COIL
有权
有电流传感器等离子激励线圈INDUKTIVPLASMA治疗设备
- 专利标题: INDUCTIVE PLASMA PROCESSOR INCLUDING CURRENT SENSOR FOR PLASMA EXCITATION COIL
- 专利标题(中): 有电流传感器等离子激励线圈INDUKTIVPLASMA治疗设备
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申请号: EP02719377.0申请日: 2002-03-29
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公开(公告)号: EP1374277B1公开(公告)日: 2007-06-13
- 发明人: VELTROP, Robert, G. , CHEN, Jian, J. , WICKER, Thomas, E.
- 申请人: LAM RESEARCH CORPORATION
- 申请人地址: 4650 Cushing Parkway Fremont, CA 94568-6516 US
- 专利权人: LAM RESEARCH CORPORATION
- 当前专利权人: LAM RESEARCH CORPORATION
- 当前专利权人地址: 4650 Cushing Parkway Fremont, CA 94568-6516 US
- 代理机构: Gill, David Alan
- 优先权: US820709 20010330
- 国际公布: WO2002080220 20021010
- 主分类号: H01J37/32
- IPC分类号: H01J37/32
摘要:
An inductive plasma processor includes an RF plasma excitation coil having plural windings, each having a first end connected in parallel to be driven by a single RF source via a single matching network. Second ends of the windings are connected to ground by termination capacitors, in turn connected by a lead to ground. A current sensor including a winding around a toroidal core is coupled to the lead between each termination capacitor and ground. The current sensor is surrounded by a grounded shield. There is minimum electromagnetic interference from an ambient RF environment to the current sensor, to provide an accurate current sensor.
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