发明授权
EP1374277B1 INDUCTIVE PLASMA PROCESSOR INCLUDING CURRENT SENSOR FOR PLASMA EXCITATION COIL 有权
有电流传感器等离子激励线圈INDUKTIVPLASMA治疗设备

INDUCTIVE PLASMA PROCESSOR INCLUDING CURRENT SENSOR FOR PLASMA EXCITATION COIL
摘要:
An inductive plasma processor includes an RF plasma excitation coil having plural windings, each having a first end connected in parallel to be driven by a single RF source via a single matching network. Second ends of the windings are connected to ground by termination capacitors, in turn connected by a lead to ground. A current sensor including a winding around a toroidal core is coupled to the lead between each termination capacitor and ground. The current sensor is surrounded by a grounded shield. There is minimum electromagnetic interference from an ambient RF environment to the current sensor, to provide an accurate current sensor.
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