发明公开
EP1376224A1 Structure for pattern formation, method for pattern formation, and application thereof
有权
Struktur zur Musterbildung，Verfahren zur Musterbildung und deren Anwendung
- 专利标题： Structure for pattern formation, method for pattern formation, and application thereof
- 专利标题（中）： Struktur zur Musterbildung，Verfahren zur Musterbildung und deren Anwendung
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申请号： EP03021172.6申请日： 1998-08-10
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公开(公告)号： EP1376224A1公开(公告)日： 2004-01-02
- 发明人: Kobayashi, Hironori , Yamamoto, Manabu , Aoki, Daigo , Kamiyama, Hironori , Hikosaka, Shinichi , Kashiwabara, Mitsuhiro
- 申请人： DAI NIPPON PRINTING CO., LTD.
- 申请人地址： 1-1, Ichigaya-Kaga-Cho 1-chome Shinjuku-ku Tokyo 162-01 JP
- 专利权人： DAI NIPPON PRINTING CO., LTD.
- 当前专利权人： DAI NIPPON PRINTING CO., LTD.
- 当前专利权人地址： 1-1, Ichigaya-Kaga-Cho 1-chome Shinjuku-ku Tokyo 162-01 JP
- 代理机构： Müller-Boré & Partner Patentanwälte
- 优先权： JP21484597 19970808; JP30029597 19971031; JP31304197 19971114; JP10036998 19980327; JP8595598 19980331; JP8629398 19980331; JP16539298 19980612; JP16731698 19980615; JP18337098 19980615
- 主分类号： G03F7/004
- IPC分类号： G03F7/004 ; G03F7/00 ; G03F7/075 ; G02B5/20 ; G02B3/00 ; B41C1/10
摘要：
A structure for pattern formation adapted for optically forming a pattern, characterized by comprising: a photocatalyst-containing layer provided on a substrate, the photocatalyst-containing layer containing a material of which the wettability is variable through photocatalytic action upon pattern-wise exposure.
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