发明公开
- 专利标题： PLASMA PROCESSING DEVICE
- 专利标题（中）： VORRICHTUNGFÜREIN PLASMAVERFAHREN
-
申请号： EP02708711申请日： 2002-03-28
-
公开(公告)号： EP1376669A4公开(公告)日： 2006-01-04
- 发明人: OHMI TADAHIRO , HIRAYAMA MASAKI , SUGAWA SHIGETOSHI , GOTO TETSUYA
- 申请人： OHMI TADAHIRO , TOKYO ELECTRON LTD
- 专利权人： OHMI TADAHIRO,TOKYO ELECTRON LTD
- 当前专利权人： OHMI TADAHIRO,TOKYO ELECTRON LTD
- 优先权： JP2001094271 2001-03-28
- 主分类号： H05H1/46
- IPC分类号： H05H1/46 ; H01J37/32 ; H01L21/302 ; H01L21/3065 ; H01L21/31
摘要：
A micro wave plasma processing device, wherein a tapered surface for relieving a variation in impedance and a member having an intermediate dielectric constant are installed between a micro wave feeding wave guide and a micro wave antenna, whereby the formation of reflected wave at the connection part between the micro wave feeding wave guide and the micro wave antenna can be suppressed to increase a power feeding efficiency and suppress discharge so as to stabilize the formation of plasma in the plasma processing device.
信息查询
IPC分类:
