A method for forming a fine pattern which comprises a step of forming a photosensitive layer on a substrate or a predetermined layer on a substrate by the use of a photosensitive composition comprising a compound capable of producing an acid through the irradiation thereof with a light and a fluorine−containing polymer containing a norbornene derivative unit having an OH group or a functional group capable of converting to an OH group by the action of an acid, an exposure step of selectively irradiating a predetermined region of the above photosensitive layer with an energy ray, a step of treating with heat the photosensitive layer after exposure, and a step of subjecting the photosensitive layer after heat treatment to a development treatment to remove selectively an exposed portion or an unexposed portion of the photosensitive layer. The method is advantageous in that it uses as a resist a photosensitive composition comprising a material exhibiting high transparency with respect to an exposure light of a short wave length, such as F 2 excimer laser, and having high practical utility.