发明公开
EP1439571A4 DEVICE AND METHOD FOR MICROWAVE PLASMA PROCESSING, AND MICROWAVE POWER SUPPLY DEVICE
有权
DEVICE AND METHOD FOR微波等离子体处理和微波功率器件
- 专利标题： DEVICE AND METHOD FOR MICROWAVE PLASMA PROCESSING, AND MICROWAVE POWER SUPPLY DEVICE
- 专利标题（中）： DEVICE AND METHOD FOR微波等离子体处理和微波功率器件
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申请号： EP02775374申请日： 2002-10-18
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公开(公告)号： EP1439571A4公开(公告)日： 2005-09-21
- 发明人: GOTO NAOHISA , OHMI TADAHIRO , HIRAYAMA MASAKI , GOTO TETSUYA
- 申请人： GOTO NAOHISA , OHMI TADAHIRO , TOKYO ELECTRON LTD
- 专利权人： GOTO NAOHISA,OHMI TADAHIRO,TOKYO ELECTRON LTD
- 当前专利权人： GOTO NAOHISA,OHMI TADAHIRO,TOKYO ELECTRON LTD
- 优先权： JP2001322529 2001-10-19
- 主分类号： H05H1/46
- IPC分类号： H05H1/46 ; B01J19/08 ; C23C16/511 ; H01J37/32 ; H01L21/205 ; H01L21/302 ; H01L21/3065 ; H01L21/31
摘要：
A microwave plasma processing device, comprising a processing container (12), a microwave generator (24), a wave guide tube (22) for guiding microwave from the microwave generator (24), and a microwave radiating member (19) for radiating the microwave having a wave length shortened by a wave-slowing plate (18) into a space inside the processing container, the wave guide tube (22) further comprising a single microwave output opening (22a) located at the position thereof corresponding to the center portion of the microwave radiating member (19).
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