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公开(公告)号:EP4191345A1
公开(公告)日:2023-06-07
申请号:EP21212556.1
申请日:2021-12-06
IPC分类号: G04B15/08 , G04B15/14 , G04B1/14 , G04D3/00 , B81C99/00 , C30B29/04 , C30B33/12 , C23C16/30 , C23C16/511
摘要: La présente invention concerne un ensemble fonctionnel (1) de micromécanique comprenant au moins une première pièce (2) avec une première surface fonctionnelle (2a) destinée à venir en contact de frottement avec une deuxième surface fonctionnelle (3a), ladite deuxième surface fonctionnelle appartenant, soit à ladite première pièce (2) soit à au moins une deuxième pièce (3) constituant avec ladite première pièce (2) ledit ensemble fonctionnel (1), ledit ensemble fonctionnel (1) étant caractérisé en ce que la première surface fonctionnelle (2a) et la deuxième surface fonctionnelle (3a) sont formées d'une première couche (9a) comprenant du diamant ultrananocristallin, nanocristallin ou microcristallin, ladite première couche (9a) étant surmontée d'une deuxième couche (9b) comportant des atomes de S et de F.
Elle se rapporte également au procédé de fonctionnalisation du diamant.-
2.
公开(公告)号:EP4182490A1
公开(公告)日:2023-05-24
申请号:EP21749105.9
申请日:2021-07-09
申请人: Rheinisch-Westfälische Technische Hochschule (RWTH) Aachen Körperschaft des öffentlichen Rechts
发明人: JARITZ, Montgomery
IPC分类号: C23C16/04 , H01J37/32 , C23C16/50 , C23C16/511 , C23C16/52
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3.
公开(公告)号:EP4130336A1
公开(公告)日:2023-02-08
申请号:EP21775031.4
申请日:2021-03-23
发明人: NISHIYAMA, Masanori , AKANUMA, Yasuhiko , SUZUKI, Tetsuya , SHIRAKURA, Akira , TANAKA, Takumi , MIKAMOTO, Kotono
IPC分类号: C23C16/511 , H05H1/24
摘要: A plasma CVD device which comprises a substrate having a three-dimensional shape such as that of a bottle and which can form a coating on the surface of various substrates under atmospheric pressure, and a coating forming method are provided. This atmospheric pressure remote plasma CVD device is provided with a dielectric chamber which has a gas inlet, an inner space and a plasma outlet, and a plasma generation device which generates plasma in the inner space. The plasma outlet is provided with a nozzle that has an opening area smaller than the average cross-sectional area of the cross-sections perpendicular to the direction of gas flow in the inner space.
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公开(公告)号:EP4063334A1
公开(公告)日:2022-09-28
申请号:EP21164784.7
申请日:2021-03-25
申请人: SCHOTT AG
发明人: BAUCH, Hartmut , BIEDENBENDER, Sylvia , DJORDJEVIC-REIß, Jovana , KLAUSE, Michaela , ROTHHAAR, Uwe , RUDIGIER-VOIGT, Eveline , WOYWOD, Tanja
IPC分类号: C03C17/00 , C03C17/30 , B05D1/00 , B05D7/22 , C23C16/04 , C23C16/511 , C23C16/515
摘要: Herein disclosed is a specific coated glass element and a specific production method thereof.
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公开(公告)号:EP3911779A1
公开(公告)日:2021-11-24
申请号:EP19745683.3
申请日:2019-06-17
发明人: BELDI, Nasser , OGE, Fabrice , CHOLLET, Patrick , JAOUEN, Mikaël
IPC分类号: C23C16/04 , B65D23/02 , B05D1/00 , H05H1/46 , H01J37/32 , C23C16/44 , C23C16/511 , C23C16/517
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公开(公告)号:EP3887565A1
公开(公告)日:2021-10-06
申请号:EP19809047.4
申请日:2019-11-22
申请人: KHS Corpoplast GmbH
IPC分类号: C23C16/04 , C23C16/40 , C23C16/455 , C23C16/511 , C23C16/52 , H01J37/32
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公开(公告)号:EP2557629B1
公开(公告)日:2018-10-03
申请号:EP10849310.7
申请日:2010-12-01
发明人: LI, Zhenyu , LU, Songtao , LIU, Shanpei , LONG, Shengya , LEI, Gaoqing , LIU, Yongtao
IPC分类号: H01P7/06 , C23C16/511 , H01J37/32
CPC分类号: H05H7/18 , H01J37/32247
摘要: The present invention relates to a cylindrical plasma resonant cavity for the PCVD (Plasma Chemical Vapor Deposition) optical fiber preform processing machine. The cylindrical plasma resonant cavity includes a cylindrical resonant cavity case. Cutoff waveguides are set at the both sides of the cylindrical resonant cavity case, and a waveguide inlet is opened in the circumferential direction of the cylindrical resonant cavity case. The cylindrical plasma resonant cavity is characterized in that: the cutoff waveguides at the both sides of the cylindrical resonant cavity case are movable end cover structure, middle vias are opened in said movable end cover structural cutoff waveguides, and bumped truncated cones configured with the cylindrical resonant cavity are set at the inside end surfaces. The present invention enables the matching between the resonant cavity and the glass tubes with different diameters through the disassembly and change of the cutoff waveguides, and enables a better matching between the waveguide devices and the resonant cavity load. The coupling effect is improved to adapt the variation of the load in the machining process, and the energy loss is decreased, thus the adaptation range of the machining of the cylindrical plasma resonant cavity is improved. With the simple structure, easy machining and manufacturing, uniform deposition, good deposition attachment effect, the present invention improves the machining precision and efficiency of the PCVD process.
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公开(公告)号:EP2656372B1
公开(公告)日:2018-07-25
申请号:EP11799160.4
申请日:2011-12-14
发明人: BRANDON, John, Robert , CULLEN, Alexander, Lamb , WILLIAMS, Stephen, David , DODSON, Joseph, Michael , WILMAN, Jonathan, James , WORT, Christopher, John, Howard
IPC分类号: H01J37/32 , C23C16/511
CPC分类号: H01J37/32458 , C23C16/274 , C23C16/511 , H01J37/32192 , H01J37/32284
摘要: A microwave plasma reactor for manufacturing synthetic diamond material via chemical vapour deposition, the microwave plasma reactor comprising: a microwave generator configured to generate microwaves at a frequency f; a plasma chamber comprising a base, a top plate, and a side wall extending from said base to said top plate defining a resonance cavity for supporting a microwave resonance mode, wherein the resonance cavity has a central rotational axis of symmetry extending from the base to the top plate, and wherein the top plate is mounted across said central rotational axis of symmetry; a microwave coupling configuration for feeding microwaves from the microwave generator into the plasma chamber; a gas flow system for feeding process gases into the plasma chamber and removing them therefrom; and a substrate holder disposed in the plasma chamber and comprising a supporting surface for supporting a substrate on which the synthetic diamond material is to be deposited in use; wherein the resonance cavity is configured to have a height, as measured from the base to the top plate of the plasma chamber, which supports a TM011 resonant mode between the base and the top plate at said frequency f, and wherein the resonance cavity is further configured to have a diameter, as measured at a height less than 50% of the height of the resonance cavity as measured from the base, which satisfies the condition that a ratio of the resonance cavity height/the resonance cavity diameter is in the range 0.3 to 1.0.
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公开(公告)号:EP3344794A1
公开(公告)日:2018-07-11
申请号:EP15757510.1
申请日:2015-09-03
IPC分类号: C23C16/511 , C23C16/458 , C23C16/52 , H01J37/20 , H01J37/32 , C23C16/27 , C30B29/04 , C23C16/02
CPC分类号: C23C16/511 , C23C16/0209 , C23C16/274 , C23C16/4586 , C23C16/52 , C30B25/12 , C30B25/205 , C30B29/04 , H01J37/32192 , H01J37/3222 , H01J37/32238 , H01J37/32247 , H01J37/32715 , H01J37/32724 , H01J37/32743
摘要: The invention relates to a coating system (1) containing at least one evacuable recipient (10), at least one substrate holder (40) which is provided for receiving a substrate (4), at least one gas supply device, by means of which at least one gaseous precursor can be introduced into the recipient (10), and at least one plasma generating device (2) which is designed to at least partly ionize the precursor. The substrate holder (40) can be moved such that the substrate holder can be brought from a working position into a rest position. The invention further relates to a method for coating a substrate, wherein the substrate (4) is brought into an evacuable recipient (10) by means of a substrate holder (40); at least one gaseous precursor is introduced into the recipient (10) by means of at least one gas supply device; and the precursor is at least partly ionized by means of at least one plasma generating device (2). The plasma (25) is ignited as long as the substrate holder (40) with the substrate (4) is located in a rest position, and the substrate holder (40) is moved into a working position after a specifiable duration.
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