发明公开
EP1450398A3 A method and an apparatus for positioning a substrate relative to a support stage
审中-公开
定位到基板上的方法和装置相对于载流子
- 专利标题： A method and an apparatus for positioning a substrate relative to a support stage
- 专利标题（中）： 定位到基板上的方法和装置相对于载流子
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申请号： EP04003863.0申请日： 2004-02-20
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公开(公告)号： EP1450398A3公开(公告)日： 2004-11-10
- 发明人: Kurita, Shinichi , Beer, Emanuel
- 申请人： Applied Materials, Inc.
- 申请人地址： 3050 Bowers Avenue Santa Clara, California 95054 US
- 专利权人： Applied Materials, Inc.
- 当前专利权人： Applied Materials, Inc.
- 当前专利权人地址： 3050 Bowers Avenue Santa Clara, California 95054 US
- 代理机构： Zimmermann, Gerd Heinrich
- 优先权： US448972P 20030220
- 主分类号： H01L21/68
- IPC分类号： H01L21/68
摘要：
In a first aspect, a substrate positioning system includes a plurality of pushers arranged in a spaced relation about a stage adapted to support a substrate. Each pusher is adapted to assume a retracted position so as to permit the substrate to be loaded onto and unloaded from the stage, extend toward an edge of the substrate that is supported by the stage, contact the edge of the substrate, and continue extending so as to cause the substrate to move relative to the stage until the substrate is calibrated to the stage. Numerous other aspects are provided.
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