公开(公告)号：EP2261393A3

公开(公告)日：2012-03-07

申请号：EP10184016.3

申请日：2005-01-17

申请人： Applied Materials, Inc.

发明人： Tiner, Robin L. ,  Park, Beom Soo ,  Anwar, Suhail ,  Won, Tae Kyung ,  Kurita, Shinichi ,  Kim, Ki Woon ,  Hou, Li ,  Wang, Qunhua ,  White, John ,  Choi, Soo Young

IPC分类号： C23C16/509 ,  H01J37/32 ,  C23C16/455 ,  C23C16/34

CPC分类号： H01J37/3244 ,  C23C16/345 ,  C23C16/455 ,  C23C16/45565 ,  C23C16/5096 ,  H01J37/32082 ,  H01J37/32091 ,  H01J37/32541 ,  H01J37/32596 ,  H01J2237/327 ,  H01J2237/3321 ,  H01J2237/3323 ,  H01J2237/3325 ,  Y10T29/49885 ,  Y10T29/49996

摘要： Embodiments of a gas diffuser plate for distributing gas in a processing chamber are provided. The gas distribution plate includes a diffuser plate having an upstream side and a downstream side, and a plurality of gas passages passing between the upstream and downstream sides of the diffuser plate. The gas passages include hollow cathode cavities at the downstream side to enhance plasma ionization. The depths, the diameters, the surface area and density of hollow cathode cavities of the gas passages that extend to the downstream end can be gradually increased from the center to the edge of the diffuser plate to improve the film thickness and property uniformity across the substrate. The increasing diameters, depths and surface areas from the center to the edge of the diffuser plate can be created by bending the diffuser plate toward downstream side, followed by machining out the convex downstream side. Bending the diffuser plate can be accomplished by a thermal process or a vacuum process. The increasing diameters, depths and surface areas from the center to the edge of the diffuser plate can also be created computer numerically controlled machining. Diffuser plates with gradually increasing diameters, depths and surface areas of the hollow cathode cavities from the center to the edge of the diffuser plate have been shown to produce improved uniformities of film thickness and film properties.

公开(公告)号：EP1126506A3

公开(公告)日：2006-01-11

申请号：EP00311440.2

申请日：2000-12-20

申请人： APPLIED MATERIALS, INC.

发明人： White, John M. ,  Kurita, Shinichi

IPC分类号： H01L21/00 ,  H01L21/68

CPC分类号： H01L21/67259 ,  H01L21/68 ,  H01L21/681 ,  H01L21/68707

摘要： The disclosure relates to a robot device (112) that either translationally or rotationally aligns a substrate (150) with a slot (174). For translational alignment, the robot device comprises a position sensor positioned in close proximity to the slot. The translational position sensor (170) determines the position of the object by moving the object parallel to the slot until it actuates the position sensor. For rotational alignment, two position sensors (140ba, 140bb) are provided that determine the relative angle between the object and a portion of the robot device and the object.

公开(公告)号：EP1526565A2

公开(公告)日：2005-04-27

申请号：EP04024958.3

申请日：2004-10-20

申请人： Applied Materials, Inc.

发明人： Kurita, Shinichi ,  Blonigan, Wendell T. ,  Tanase, Yoshiaki

IPC分类号： H01L21/00

CPC分类号： H01L21/67201 ,  B65G49/064 ,  B65G49/067 ,  B65G49/068 ,  B65G2249/02 ,  H01L21/67236 ,  Y10S414/136 ,  Y10S414/137 ,  Y10S414/139

摘要： A load lock chamber and method for transferring large area substrates is provided. In one embodiment, a load lock chamber suitable for transferring large area substrates includes a plurality of vertically stacked single substrate transfer chambers. The configuration of vertically stacked single substrate transfer chambers contributes to reduced size and greater throughput as compared to conventional state of the art, dual slot dual substrate designs. Moreover, the increased throughput has been realized at reduced pumping and venting rates, which corresponds to reduced probability of substrate contamination due to particulates and condensation.

摘要翻译： 提供了一种用于传送大面积基板的装载锁定室和方法。 在一个实施例中，适于传送大面积衬底的负载锁定室包括多个垂直堆叠的单个衬底传送室。 垂直堆叠的单个基板传送室的配置与现有技术的双槽双面基板设计相比，有助于减小尺寸和更大的通量。 此外，在减少的泵送和排气速率下已经实现了增加的产量，这对应于由于颗粒和冷凝引起的底物污染的可能性降低。

公开(公告)号：EP1450392A1

公开(公告)日：2004-08-25

申请号：EP04003865.5

申请日：2004-02-20

申请人： Applied Materials, Inc.

发明人： Kurita, Shinichi ,  Kusler, Rex

IPC分类号： H01L21/00 ,  G03F9/00

CPC分类号： G03F7/70825 ,  G03F7/70666 ,  G03F7/707 ,  G03F7/70716 ,  G03F7/70775 ,  G03F7/70791 ,  G03F9/7011 ,  H01L21/68

摘要： An alignment device is provided that includes (1) a first pusher adapted to contact an edge of a substrate supported on a stage and to laterally translate along a first path; (2) a second pusher adapted to contact the substrate edge and to laterally translate along a second path that is at an angle to and intersects the first path; (3) a frame, to which the first and second pushers are movably coupled, adapted to maintain the first and second pushers at an elevation of the substrate edge; (4) a first biasing element coupled between the first pusher and the frame and adapted to bias the first pusher against the substrate edge; and (5) a second biasing element coupled between the second pusher and the frame and adapted to bias the second pusher against the substrate edge independent of the biasing of the first pusher. Other aspects are provided.

摘要翻译： 提供了一种对准装置确实包括（1）第一推动器angepasst以支撑在一个阶段的基板的边缘和后期反弹沿着第一路径平移联系; （2）第二推动器angepasst于基板和边缘接触到晚期反弹沿着第二路径平移所做的是在在对角和交叉的第一路径; （3）的框架中，向其中在第一和第二推杆可移动地联接，angepasst保持在在基板边缘的仰角的第一和第二推动器; （4）耦合在所述第一推动器和所述框架和angepasst偏压抵靠衬底边缘的第一推动器之间的第一偏压元件; 和（5）耦接在所述第二推动器和所述框架和angepasst之间以偏压第二推动器抵靠边缘基板独立于第一推动器的偏压的第二偏压元件。 还提供了其他方面。

公开(公告)号：EP1526565A3

公开(公告)日：2011-07-06

申请号：EP04024958.3

申请日：2004-10-20

申请人： Applied Materials, Inc.

发明人： Kurita, Shinichi ,  Blonigan, Wendell T. ,  Tanase, Yoshiaki

IPC分类号： H01L21/00

CPC分类号： H01L21/67201 ,  B65G49/064 ,  B65G49/067 ,  B65G49/068 ,  B65G2249/02 ,  H01L21/67236 ,  Y10S414/136 ,  Y10S414/137 ,  Y10S414/139

摘要： A load lock chamber and method for transferring large area substrates is provided. In one embodiment, a load lock chamber suitable for transferring large area substrates includes a plurality of vertically stacked single substrate transfer chambers. The configuration of vertically stacked single substrate transfer chambers contributes to reduced size and greater throughput as compared to conventional state of the art, dual slot dual substrate designs. Moreover, the increased throughput has been realized at reduced pumping and venting rates, which corresponds to reduced probability of substrate contamination due to particulates and condensation.

公开(公告)号：EP1126506A2

公开(公告)日：2001-08-22

申请号：EP00311440.2

申请日：2000-12-20

申请人： Applied Materials, Inc.

发明人： White, John M. ,  Kurita, Shinichi

IPC分类号： H01L21/00

CPC分类号： H01L21/67259 ,  H01L21/68 ,  H01L21/681 ,  H01L21/68707

摘要： The disclosure relates to a robot device (112) that either translationally or rotationally aligns a substrate (150) with a slot (174). For translational alignment, the robot device comprises a position sensor positioned in close proximity to the slot. The translational position sensor (170) determines the position of the object by moving the object parallel to the slot until it actuates the position sensor. For rotational alignment, two position sensors (140ba, 140bb) are provided that determine the relative angle between the object and a portion of the robot device and the object.

摘要翻译： 本公开涉及一种机器人装置（112），其将基板（150）平移或旋转对准槽（174）。 对于平移对准，机器人装置包括位置传感器，该位置传感器位于狭缝附近。 平移位置传感器（170）通过将物体平行于槽移动直到其致动位置传感器来确定物体的位置。 为了旋转对准，提供了两个位置传感器（140ba，140bb），其确定物体与机器人装置和物体的一部分之间的相对角度。

公开(公告)号：EP1808889A3

公开(公告)日：2011-12-28

申请号：EP07000596.2

申请日：2007-01-12

申请人： Applied Materials, Inc.

发明人： Lee, Jae-Chull ,  Kurita, Shinichi ,  White, John M. ,  Anwar, Suhail

IPC分类号： H01L21/67

CPC分类号： H01L21/67201 ,  Y10S414/139

摘要： Embodiments of the invention include a chamber body (148) having at least one of a top or bottom (104,106) decoupled from the sidewalls of the chamber body. The invention is suitable for use as a load lock chamber, substrate transfer chamber and vacuum processing chambers, among others.

公开(公告)号：EP2261393A2

公开(公告)日：2010-12-15

申请号：EP10184016.3

申请日：2005-01-17

申请人： Applied Materials, Inc.

发明人： Tiner, Robin L. ,  Park, Beom Soo ,  Anwar, Suhail ,  Won, Tae Kyung ,  Kurita, Shinichi ,  Kim, Ki Woon ,  Hou, Li ,  Wang, Qunhua ,  White, John ,  Choi, Soo Young

IPC分类号： C23C16/505 ,  H01J37/32 ,  C23C16/455

CPC分类号： H01J37/3244 ,  C23C16/345 ,  C23C16/455 ,  C23C16/45565 ,  C23C16/5096 ,  H01J37/32082 ,  H01J37/32091 ,  H01J37/32541 ,  H01J37/32596 ,  H01J2237/327 ,  H01J2237/3321 ,  H01J2237/3323 ,  H01J2237/3325 ,  Y10T29/49885 ,  Y10T29/49996

摘要： Embodiments of a gas diffuser plate for distributing gas in a processing chamber are provided. The gas distribution plate includes a diffuser plate having an upstream side and a downstream side, and a plurality of gas passages passing between the upstream and downstream sides of the diffuser plate. The gas passages include hollow cathode cavities at the downstream side to enhance plasma ionization. The depths, the diameters, the surface area and density of hollow cathode cavities of the gas passages that extend to the downstream end can be gradually increased from the center to the edge of the diffuser plate to improve the film thickness and property uniformity across the substrate. The increasing diameters, depths and surface areas from the center to the edge of the diffuser plate can be created by bending the diffuser plate toward downstream side, followed by machining out the convex downstream side. Bending the diffuser plate can be accomplished by a thermal process or a vacuum process. The increasing diameters, depths and surface areas from the center to the edge of the diffuser plate can also be created computer numerically controlled machining. Diffuser plates with gradually increasing diameters, depths and surface areas of the hollow cathode cavities from the center to the edge of the diffuser plate have been shown to produce improved uniformities of film thickness and film properties.

摘要翻译： 提供了用于在处理室中分配气体的气体扩散板的实施例。 气体分配板包括具有上游侧和下游侧的扩散板，以及在扩散板的上游侧和下游侧之间通过的多个气体通路。 气体通道包括在下游侧的空心阴极腔，以增强等离子体电离。 延伸到下游端的气体通道的空心阴极腔的深度，直径，表面积和密度可以从扩散板的中心到边缘逐渐增加，以改善衬底上的膜厚度和性能均匀性 。 从扩散板的中心到边缘的直径，深度和表面积的增加可以通过向下游侧弯曲扩散板，然后在凸出的下游侧加工出来。 扩散板的弯曲可以通过热处理或真空工艺来实现。 从扩散板的中心到边缘的直径，深度和表面积的增加也可以用计算机数字控制加工。 具有从扩散板的中心到边缘的中空阴极腔的直径逐渐增加，深度和表面积逐渐增加的扩散板已被证明可产生改善的膜厚度和膜性质的均匀性。

公开(公告)号：EP1808889A2

公开(公告)日：2007-07-18

申请号：EP07000596.2

申请日：2007-01-12

申请人： Applied Materials, Inc.

发明人： Lee, Jae-Chull ,  Kurita, Shinichi ,  White, John M. ,  Anwar, Suhail

IPC分类号： H01L21/677

CPC分类号： H01L21/67201 ,  Y10S414/139

摘要： Embodiments of the invention include a chamber body (148) having at least one of a top or bottom (104,106) decoupled from the sidewalls of the chamber body. The invention is suitable for use as a load lock chamber, substrate transfer chamber and vacuum processing chambers, among others.

摘要翻译： 本发明的实施例包括具有从室主体的侧壁分离的顶部或底部（104,106）中的至少一个的室主体（148）。 本发明适用于负载锁定室，基板传送室和真空处理室等。

公开(公告)号：EP1450398A3

公开(公告)日：2004-11-10

申请号：EP04003863.0

申请日：2004-02-20

申请人： Applied Materials, Inc.

发明人： Kurita, Shinichi ,  Beer, Emanuel

IPC分类号： H01L21/68

CPC分类号： H01L21/68728 ,  G03F7/70666 ,  G03F7/707 ,  G03F7/70716 ,  G03F7/70775 ,  G03F7/70791 ,  G03F7/70825 ,  G03F9/7011 ,  H01L21/682 ,  H01L21/68778

摘要： In a first aspect, a substrate positioning system includes a plurality of pushers arranged in a spaced relation about a stage adapted to support a substrate. Each pusher is adapted to assume a retracted position so as to permit the substrate to be loaded onto and unloaded from the stage, extend toward an edge of the substrate that is supported by the stage, contact the edge of the substrate, and continue extending so as to cause the substrate to move relative to the stage until the substrate is calibrated to the stage. Numerous other aspects are provided.

摘要翻译： 在第一个方面，一种系统包括在大约阶段angepasst以支持基板隔开的关系布置推杆多个基板的定位。 每个推动器是angepasst假设一个缩回位置，以便允许被装载到和从台卸载基板，朝向在所述基板的边缘延伸并通过台支撑，接触所述基板的边缘，并且继续扩展太阳 以使直到基板被校准到舞台基板移动相对于台。 还提供了许多其他方面。