发明公开
EP1500641A4 HIGH-PURITY (FLUOROALKYL)BENZENE DERIVATIVE AND PROCESS FOR PRODUCING THE SAME
审中-公开
荷兰(FLUORALKYL)BENZOLDERIVATE UND VERFAHREN ZU DEREN HERSTELLUNG
- 专利标题: HIGH-PURITY (FLUOROALKYL)BENZENE DERIVATIVE AND PROCESS FOR PRODUCING THE SAME
- 专利标题(中): 荷兰(FLUORALKYL)BENZOLDERIVATE UND VERFAHREN ZU DEREN HERSTELLUNG
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申请号: EP03723191申请日: 2003-04-24
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公开(公告)号: EP1500641A4公开(公告)日: 2006-05-31
- 发明人: HIDAKA T , FUSHIMI N , YOSHIMURA T , KAWAI T
- 申请人: MITSUBISHI GAS CHEMICAL CO
- 专利权人: MITSUBISHI GAS CHEMICAL CO
- 当前专利权人: MITSUBISHI GAS CHEMICAL CO
- 优先权: JP2002128158 2002-04-30
- 主分类号: C07C29/136
- IPC分类号: C07C29/136 ; C07B39/00 ; C07B61/00 ; C07C29/147 ; C07C29/62 ; C07C33/46 ; C07C37/56 ; C07C39/24 ; C07C45/41 ; C07C45/45 ; C07C45/63 ; C07C45/67 ; C07C47/55 ; C07C49/80 ; C07C51/04 ; C07C51/363 ; C07C51/62 ; C07C63/70 ; C07C67/14 ; C07C67/307 ; C07C69/76 ; C07C209/26 ; C07C211/29 ; C07C231/02 ; C07C233/65 ; C07C253/20 ; C07C255/49 ; C07C255/50 ; C07C37/62 ; C07C63/72 ; C07C209/68 ; C07C211/52 ; C07C231/12 ; C07C253/30
摘要:
The process for producing a (fluoroalkyl)benzene derivative according to the present invention comprises a step of reducing the total content of group 3 to group 12 transition metals in an alkylbenzene derivative to 500 ppm or less in terms of metal atoms; a step of halogenating the branched alkyl group of the purified alkylbenzene derivative by a photohalogenation to obtain a (haloalkyl)benzene derivative; and a step of subjecting the (haloalkyl)benzene derivative to a halogen-fluorine exchange using HF in an amount of 10 mol or higher per one mole of the (haloalkyl)benzene derivative. The (fluoroalkyl)benzene derivative produced by the process is reduced in the content of impurities such as residual halogens and residual metals, and is useful as intermediates for functional chemical products for use in applications such as medicines and electronic materials.
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