发明公开
EP1748469A1 LIQUID FOR IMMERSION EXPOSURE AND IMMERSION EXPOSURE METHOD
审中-公开
FLÜSSIGKEITZUR IMMERSIONSBELICHTUNG UND IMMERSIONSBELICHTUNGSVERFAHREN
- 专利标题： LIQUID FOR IMMERSION EXPOSURE AND IMMERSION EXPOSURE METHOD
- 专利标题（中）： FLÜSSIGKEITZUR IMMERSIONSBELICHTUNG UND IMMERSIONSBELICHTUNGSVERFAHREN
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申请号： EP05741390.8申请日： 2005-05-19
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公开(公告)号： EP1748469A1公开(公告)日： 2007-01-31
- 发明人: MIYAMATSU, Takashi , NEMOTO, Hiroaki , WANG, Yong
- 申请人： JSR Corporation
- 申请人地址： 5-6-10, Tsukiji, Chuo-ku Tokyo 104-8410 JP
- 专利权人： JSR Corporation
- 当前专利权人： JSR Corporation
- 当前专利权人地址： 5-6-10, Tsukiji, Chuo-ku Tokyo 104-8410 JP
- 代理机构： TBK-Patent
- 优先权： JP2004151711 20040521; JP2004252289 20040831; JP2005011431 20050119; JP2005049468 20050224
- 国际公布： WO2005114711 20051201
- 主分类号： H01L21/027
- IPC分类号： H01L21/027 ; G03F7/38
摘要：
An immersion exposure liquid which exhibits a high refractive index, prevents elution and dissolution of a photoresist film or its upper layer film component, and reduces defects during formation of a resist pattern when used in an immersion exposure method, and an immersion exposure method using the immersion exposure liquid. The immersion exposure liquid is used for an immersion exposure device or an immersion exposure method in which a substrate is exposed through a liquid provided between a lens of a projection optical system and the substrate, the immersion exposure liquid being liquid in an operating temperature range of the immersion exposure device and including an alicyclic hydrocarbon compound or a cyclic hydrocarbon compound containing a silicon atom in the ring structure.
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