公开(公告)号：EP1586570A1

公开(公告)日：2005-10-19

申请号：EP04701104.4

申请日：2004-01-09

申请人： JSR Corporation

发明人： MIYAMATSU, Takashi ,  NIWATA, Hirokazu ,  EBATA, Satoshi ,  WANG, Yong

IPC分类号： C07D333/46 ,  C07D333/78 ,  C08L33/06

CPC分类号： C07D333/72 ,  C07D333/46 ,  C07D333/78 ,  G03F7/0045 ,  G03F7/0392 ,  G03F7/0397 ,  Y10S430/106 ,  Y10S430/111 ,  Y10S430/123

摘要： A sulfonium salt compound excelling in transparency to deep ultraviolet rays at a wavelength of 220 nm or less, exhibiting well-balanced excellent performance such as sensitivity, resolution, pattern form, LER, and storage stability when used as a photoacid generator, a photoacid generator comprising the sulfonium salt compound, and a positive-tone radiation-sensitive resin composition containing the photoacid generator.
The sulfonium salt compound is shown by the following formula (I),
wherein R 1 represents a halogen atom, an alkyl group, a monovalent alicyclic hydrocarbon group, an alkoxyl group, or -OR 3 group, wherein R 3 is a monovalent alicyclic hydrocarbon group, R 2 represents a (substituted)-alkyl group or two or more R 2 groups form a cyclic structure, p is 0-7, q is 0-6, n is 0-3, and X - indicates a sulfonic acid anion.
The positive-tone radiation-sensitive resin composition comprises (A) a photoacid generator of the sulfonium-salt compound and (B) an acid-dissociable group-containing resin.

摘要翻译： 锍盐化合物在220纳米或更小的波长的透明性远紫外线优异，参展良好平衡的优良性能：如灵敏度，分辨率，图案形状，LER，和储存稳定性当作为光产酸剂，光产酸剂使用的 包含所述锍盐化合物，以及正型放射线敏感性树脂组合物包含光酸产生剂。 的硫鎓盐化合物为下述式（I） worinř所示<1> darstellt卤原子的烷基团，一价脂环烃基，在烷氧基或-OR <3 >基，worin - [R <3>的一价脂环族烃基，R <2> darstellt一个（substituiertem）烷基或两个或多个R <2>基团形成环状结构，p是0-7，q是0 -6，n为0-3，并且X < - >表示磺酸阴离子。 的正型放射线敏感性树脂组合物包括（a）的锍盐化合物和（B）以酸解离性基的树脂的光酸产生剂。

公开(公告)号：EP2339339A1

公开(公告)日：2011-06-29

申请号：EP09816172.2

申请日：2009-09-24

申请人： JSR Corporation

发明人： TAMORI, Kouji ,  FUKUTA, Tetsuo ,  MIYAJI, Masaaki ,  WANG, Yong ,  ABE, Takayoshi ,  OKANO, Yuusuke ,  MOMIYAMA, Masaki ,  KAWAI, Takahiro

IPC分类号： G01N30/88 ,  C07K14/31

CPC分类号： C07K1/22 ,  B01J20/286 ,  B01J20/321 ,  B01J20/3219 ,  B01J20/3274 ,  Y10T428/29

摘要： An affinity chromatography packing material includes porous mother particles that include a copolymer of a monomer mixture including a crosslinkable vinyl monomer and an epoxy group-containing vinyl monomer, a ligand being bound to the porous mother particles, and the porous mother particles including a ring-opening epoxy group produced by ring-opening of the epoxy group included in the porous mother particles.

摘要翻译： 亲和层析填充材料包括多孔母体颗粒，其包括包含可交联乙烯基单体和含环氧基的乙烯基单体的单体混合物的共聚物，与多孔母体颗粒结合的配体，以及多孔母体颗粒， 开环环氧基，其由包含在多孔母体颗粒中的环氧基开环制备。

公开(公告)号：EP1600437A1

公开(公告)日：2005-11-30

申请号：EP04713184.2

申请日：2004-02-20

申请人： JSR Corporation

发明人： EBATA, Satoshi ,  WANG, Yong ,  NISHIMURA, Isao

IPC分类号： C07C309/23 ,  C07C381/12 ,  C07D207/46 ,  C08K5/41 ,  C08L101/12 ,  G03F7/004

CPC分类号： C07C309/19 ,  C07C309/17 ,  C07C309/23 ,  C07C381/12 ,  C07C2602/42 ,  C07C2603/86 ,  C07D207/46 ,  G03F7/0045 ,  G03F7/0382 ,  G03F7/0392 ,  G03F7/0397 ,  G03F7/0757 ,  Y10S430/106 ,  Y10S430/111 ,  Y10S430/115 ,  Y10S430/122 ,  Y10S430/126

摘要： The invention provides novel acid generators which are unproblematic in combustibility and accumulation inside the human body and can generate acids having high acidities and high boiling points and exhibiting properly short diffusion lengths in resist coating films and which permit the formation of resist patterns excellent smoothness with little dependence on the denseness of a mask pattern; sulfonic acids generated from the acid generators; sulfonyl halides useful as raw material in the synthesis of the acid generators; and radiation-sensitive resin compositions containing the acid generators. The acid generators have structures represented by the general formula (I),
wherein R 1 is a monovalent substituent such as alkoxycarbonyl, alkylsulfonyl, or alkoxysulfonyl; R 2 to R 4 are each hydrogen or alkyl; k is an integer of 0 or above; and n is an integer of 0 to 5. Among the radiation-sensitive resin compositions, a positive one contains a resin having acid-dissociable groups in addition to the above acid generator, while a negative one contains an alkali-soluble resin and a crosslinking agent in addition to the acid generator.

公开(公告)号：EP2574631A1

公开(公告)日：2013-04-03

申请号：EP11759404.4

申请日：2011-03-23

申请人： JSR Corporation

发明人： TAMORI, Kouji ,  FUKUTA, Tetsuo ,  MIYAJI, Masaaki ,  WANG, Yong ,  ABE, Takayoshi ,  OKANO, Yusuke ,  MOMIYAMA, Masaki ,  KAWAI, Takahiro

IPC分类号： C07K17/08 ,  C07K1/22 ,  C07K19/00 ,  C12N15/09 ,  G01N30/88

CPC分类号： C07K1/22 ,  B01D15/3804 ,  B01J20/286 ,  B01J20/288 ,  B01J20/3219 ,  B01J20/3274 ,  C07K2317/10

摘要： Provided are a filler for affinity chromatography which has excellent alkali resistance, and a method for isolating immunoglobulin. The filler for affinity chromatography is a filler in which a protein represented by the following formula (1) is immobilized on a carrier.

        R-R 2      (1)

wherein R represents an amino acid sequence consisting of 4 to 300 amino acid residues containing a region consisting of 4 to 20 contiguous histidine residues; and R 2 represents an amino acid sequence capable of binding to immunoglobulin, the amino acid sequence consisting of 50 to 500 amino acid residues containing Z domain of Protein A or a fragment thereof, or a variant thereof, provided that the R binds to C-terminus or N-terminus of the R 2 .

摘要翻译： 提供具有优异的耐碱性的亲和色谱法的填充剂和分离免疫球蛋白的方法。 用于亲和层析的填料是其中由下式（1）表示的蛋白质固定在载体上的填料。 €ƒ€ƒ€ƒ€ƒ€ƒ€ƒR-R 2€ƒ€ƒ€ƒ€ƒ（1）其中R表示由含有区域的4至300个氨基酸残基组成的氨基酸序列 由4至20个连续组氨酸残基组成; 并且R 2表示能够结合免疫球蛋白的氨基酸序列，所述氨基酸序列由含有蛋白A的Z结构域或其片段的50至500个氨基酸残基或其变体组成，条件是R与C- R 2的末端或N末端。

公开(公告)号：EP2562178A1

公开(公告)日：2013-02-27

申请号：EP11765573.8

申请日：2011-03-29

申请人： JSR Corporation

发明人： TAMORI, Kouji ,  ABE, Takayoshi ,  OKANO, Yusuke ,  MOMIYAMA, Masaki ,  KAWAI, Hiroshi ,  HYUGAJI, Satoshi ,  WANG, Yong

IPC分类号： C07K1/22 ,  B01D15/08 ,  B01J20/281 ,  C08F8/00 ,  C08F20/20 ,  C08F20/32 ,  C07K16/00

CPC分类号： C07K1/18 ,  B01D15/3804 ,  B01D15/3809 ,  B01J20/286 ,  C07K1/22 ,  C08F222/1006 ,  C08F220/20 ,  C08F2220/325 ,  C08F2220/281 ,  C08F220/58

摘要： Provided is a filler for affinity chromatography which is useful for protein purification and contains porous particles that have a high dynamic binding capacity for proteins and excellent pressure characteristics. The filler for affinity chromatography of the present invention is characterized in that it includes a porous particle consisting of a polymer of vinyl monomer including a cross-linkable vinyl monomer that contains hydroxyl group but does not contain epoxy group and an epoxy group-containing non-cross-linkable vinyl monomer, or a cross-linkable vinyl monomer that contains hydroxyl group and epoxy group, ligands bound to the porous particle, and ring-opened epoxy groups.

摘要翻译： 本发明提供一种用于蛋白质纯化的亲和色谱用填充剂，其含有对蛋白质具有高动态结合能力和优异的压力特性的多孔颗粒。 本发明的亲合色谱用填充剂的特征在于，含有由乙烯基单体的聚合物构成的多孔粒子，该乙烯基单体含有含羟基但不含环氧基的交联性乙烯基单体， 可交联的乙烯基单体或含有羟基和环氧基团的可交联乙烯基单体，与多孔颗粒结合的配体和开环环氧基团。

公开(公告)号：EP2562178B1

公开(公告)日：2015-05-06

申请号：EP11765573.8

申请日：2011-03-29

申请人： JSR Corporation

发明人： TAMORI, Kouji ,  ABE, Takayoshi ,  OKANO, Yusuke ,  MOMIYAMA, Masaki ,  KAWAI, Hiroshi ,  HYUGAJI, Satoshi ,  WANG, Yong

IPC分类号： C07K1/22 ,  B01D15/38 ,  B01J20/286 ,  C08F8/00 ,  C08F20/20 ,  C08F20/32 ,  C07K16/00 ,  C07K1/18 ,  C08F222/10

CPC分类号： C07K1/18 ,  B01D15/3804 ,  B01D15/3809 ,  B01J20/286 ,  C07K1/22 ,  C08F222/1006 ,  C08F220/20 ,  C08F2220/325 ,  C08F2220/281 ,  C08F220/58

公开(公告)号：EP1953595A1

公开(公告)日：2008-08-06

申请号：EP06823478.0

申请日：2006-11-20

申请人： JSR Corporation

发明人： NAKAMURA, Atsushi ,  WANG, Yong ,  TSUJI, Takayuki

IPC分类号： G03F7/039 ,  G03F7/20 ,  H01L21/027

CPC分类号： G03F7/2041 ,  G03F7/0397

摘要： A radiation-sensitive resin composition for liquid immersion lithography which produces an excellent pattern profile, exhibits excellent resolution, provides sufficient focal depth allowance, and elutes only the minimal amount in the liquid when brought in contact with the liquid during exposure to radiation. The radiation-sensitive resin composition forms a photoresist film in liquid immersion lithography, in which radiation is emitted through a liquid for use in liquid immersion lithography having a refractive index larger than 1.44 and smaller than 1.85 at a wavelength of 193 nm, existing between a lens and a photoresist, the composition comprising a resin having a recurring unit with a lactone structure, which is insoluble or scarcely soluble in alkali, but becomes soluble in alkali by the action of an acid, and a radiation-sensitive acid generator.

摘要翻译： 用于液体浸没式光刻的辐射敏感性树脂组合物产生优异的图案轮廓，表现出优异的分辨率，提供足够的焦深允许量，并且在暴露于辐射期间与液体接触时仅在液体中洗脱最少量。 辐射敏感树脂组合物在液浸光刻中形成光致抗蚀剂膜，其中辐射通过用于液体浸没光刻的液体发射，该液体具有在193nm波长处大于1.44且小于1.85的折射率，其存在于 透镜和光致抗蚀剂，所述组合物包含具有内酯结构的重复单元的树脂，其不溶于或几乎不溶于碱，但通过酸的作用变得可溶于碱，以及辐射敏感酸发生剂。

公开(公告)号：EP1602975A1

公开(公告)日：2005-12-07

申请号：EP03789633.9

申请日：2003-12-24

申请人： JSR Corporation

发明人： NISHIMURA, Isao ,  FUJIWARA, Kouichi ,  KOBAYASHI, Eiichi ,  SHIMOKAWA, Tsutomu ,  NAKAMURA, Atsushi ,  YONEDA, Eiji ,  WANG, Yong

IPC分类号： G03F7/004 ,  G03F7/039 ,  C08F4/00

CPC分类号： G03F7/039 ,  G03F7/0046 ,  G03F7/0397 ,  G03F7/2006

摘要： A radiation-sensitive resin composition comprising an acid-labile group-containing resin obtained by living radical polymerization having a specific structure which is insoluble or scarcely soluble in alkali, but becomes alkali soluble by the action of an acid, and a photoacid generator, wherein the ratio of weight average molecular weight to number average molecular weight (weight average molecular weight/number average molecular weight) of the acid-labile group-containing-resin is smaller than 1.5.

摘要翻译： 一种辐射敏感树脂组合物，其包含通过活性自由基聚合获得的含酸不稳定基团的树脂和光酸产生剂，其中所述含酸不稳定基团的树脂通过活性自由基聚合获得，所述树脂具有不溶于或几乎不溶于碱但通过酸的作用变为碱溶性的特定结构， 含酸不稳定基团的树脂的重均分子量与数均分子量之比（重均分子量/数均分子量）小于1.5。

公开(公告)号：EP1748469A1

公开(公告)日：2007-01-31

申请号：EP05741390.8

申请日：2005-05-19

申请人： JSR Corporation

发明人： MIYAMATSU, Takashi ,  NEMOTO, Hiroaki ,  WANG, Yong

IPC分类号： H01L21/027 ,  G03F7/38

CPC分类号： G03F7/2041

摘要： An immersion exposure liquid which exhibits a high refractive index, prevents elution and dissolution of a photoresist film or its upper layer film component, and reduces defects during formation of a resist pattern when used in an immersion exposure method, and an immersion exposure method using the immersion exposure liquid. The immersion exposure liquid is used for an immersion exposure device or an immersion exposure method in which a substrate is exposed through a liquid provided between a lens of a projection optical system and the substrate, the immersion exposure liquid being liquid in an operating temperature range of the immersion exposure device and including an alicyclic hydrocarbon compound or a cyclic hydrocarbon compound containing a silicon atom in the ring structure.

摘要翻译： 表现出高折射率的浸渍曝光液体，防止光刻胶膜或其上层膜成分的溶出和溶解，并且在浸渍曝光方法中使用时减少形成抗蚀剂图案时的缺陷，以及使用 浸渍曝光液体。 浸渍曝光液体用于浸渍曝光装置或浸渍曝光方法，其中通过设置在投影光学系统的透镜和基板之间的液体曝光基板，浸没曝光液体在液体的工作温度范围内为液体 浸渍曝光装置，并且在环结构中包含脂环族烃化合物或含有硅原子的环状烃化合物。