公开(公告)号：EP1708027B1

公开(公告)日：2019-03-13

申请号：EP05703585.9

申请日：2005-01-14

申请人： JSR Corporation

发明人： KIMURA, Toru ,  NISHIMURA, Yukio ,  UTAKA, Tomohiro ,  NEMOTO, Hiroaki ,  NAKAMURA, Atsushi ,  CHIBA, Takashi ,  NAKAGAWA, Hiroki

IPC分类号： G03F7/11 ,  G03F7/20 ,  H01L21/027

公开(公告)号：EP1748469A1

公开(公告)日：2007-01-31

申请号：EP05741390.8

申请日：2005-05-19

申请人： JSR Corporation

发明人： MIYAMATSU, Takashi ,  NEMOTO, Hiroaki ,  WANG, Yong

IPC分类号： H01L21/027 ,  G03F7/38

CPC分类号： G03F7/2041

摘要： An immersion exposure liquid which exhibits a high refractive index, prevents elution and dissolution of a photoresist film or its upper layer film component, and reduces defects during formation of a resist pattern when used in an immersion exposure method, and an immersion exposure method using the immersion exposure liquid. The immersion exposure liquid is used for an immersion exposure device or an immersion exposure method in which a substrate is exposed through a liquid provided between a lens of a projection optical system and the substrate, the immersion exposure liquid being liquid in an operating temperature range of the immersion exposure device and including an alicyclic hydrocarbon compound or a cyclic hydrocarbon compound containing a silicon atom in the ring structure.

摘要翻译： 表现出高折射率的浸渍曝光液体，防止光刻胶膜或其上层膜成分的溶出和溶解，并且在浸渍曝光方法中使用时减少形成抗蚀剂图案时的缺陷，以及使用 浸渍曝光液体。 浸渍曝光液体用于浸渍曝光装置或浸渍曝光方法，其中通过设置在投影光学系统的透镜和基板之间的液体曝光基板，浸没曝光液体在液体的工作温度范围内为液体 浸渍曝光装置，并且在环结构中包含脂环族烃化合物或含有硅原子的环状烃化合物。