发明公开
- 专利标题： POSITIONALLY MODIFIED siRNA CONSTRUCTS
- 专利标题（中）： 位修饰siRNA构建
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申请号： EP04754153.7申请日： 2004-06-03
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公开(公告)号： EP1765074A2公开(公告)日： 2007-03-28
- 发明人: BHAT, Balkrishen , SWAYZE, Eric , PRAKASH, Thazha, P. , ALLERSON, Charles , DANDE, Prasad , GRIFFEY, Richard, H.
- 申请人： ISIS PHARMACEUTICALS, INC.
- 申请人地址： 2292 Faraday Avenue Carlsbad, CA 92008 US
- 专利权人： ISIS PHARMACEUTICALS, INC.
- 当前专利权人： ISIS PHARMACEUTICALS, INC.
- 当前专利权人地址： 2292 Faraday Avenue Carlsbad, CA 92008 US
- 代理机构： Hallybone, Huw George
- 国际公布： WO2005120230 20051222
- 主分类号： A01N43/04
- IPC分类号： A01N43/04
摘要：
The present invention provides oligomeric compounds having sufficient complementarity to hybridize to a nucleic acid target and methods for their use in modulating gene expression. In one embodiment the oligomeric compounds comprise double stranded constructs wherein one of the strands capable of hybridizing to a nucleic acid target, and has a plurality of modified ribofuranosyl nucleosides at defined locations. The presense of modifications at such defined positions greatly enhances the properties of the corresponding compositions.
公开/授权文献
- EP1765074B1 POSITIONALLY MODIFIED siRNA CONSTRUCTS 公开/授权日：2012-10-03
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