Invention Publication
- Patent Title: SPHERICAL ABERRATION CORRECTION ELECTROSTATIC LENS, INPUT LENS, ELECTRON SPECTROSCOPIC DEVICE, PHOTOELECTRON MICROSCOPE, AND MEASUREMENT SYSTEM
- Patent Title (中): 静电透镜校正球面像差，输入镜头，电子分光设备，光电子显微镜和测量系统
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Application No.: EP04822204.6Application Date: 2004-11-09
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Publication No.: EP1793410A1Publication Date: 2007-06-06
- Inventor: DAIMON, Hiroshi , MATSUDA, Hiroyuki , KATO, Makoto , KUDO, Masato
- Applicant: National University Corporation Nara Institute of Science and Technology , JEOL Ltd.
- Applicant Address: 8916-5, Takayamacho Ikoma-shi, Nara 630-0192 JP
- Assignee: National University Corporation Nara Institute of Science and Technology,JEOL Ltd.
- Current Assignee: National University Corporation Nara Institute of Science and Technology,JEOL Ltd.
- Current Assignee Address: 8916-5, Takayamacho Ikoma-shi, Nara 630-0192 JP
- Agency: Patentanwälte Lambsdorff & Lange
- Priority: JP2004208926 20040715
- International Announcement: WO2006008840 20060126
- Main IPC: H01J37/244
- IPC: H01J37/244 ; H01J37/285 ; H01J37/12 ; G01N23/227
Abstract:
A mesh (M) having an ellipsoid shape or a shape close to the ellipsoid shape is attached to an electrode (EL1) among electrodes (EL1 to ELn). Voltages of the later-stage electrodes (EL2 to ELn) are appropriately set. With this arrangement, a local negative spherical aberration generated by the mesh (M) is cancelled out with a positive spherical aberration. This optimizes an electric field distribution. As a result, this realizes an electrostatic lens whose acceptance angle is extended to about ±60°.
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