发明公开
- 专利标题： SPHERICAL ABERRATION CORRECTION ELECTROSTATIC LENS, INPUT LENS, ELECTRON SPECTROSCOPIC DEVICE, PHOTOELECTRON MICROSCOPE, AND MEASUREMENT SYSTEM
- 专利标题（中）： 静电透镜校正球面像差，输入镜头，电子分光设备，光电子显微镜和测量系统
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申请号： EP04822204.6申请日： 2004-11-09
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公开(公告)号： EP1793410A1公开(公告)日： 2007-06-06
- 发明人: DAIMON, Hiroshi , MATSUDA, Hiroyuki , KATO, Makoto , KUDO, Masato
- 申请人： National University Corporation Nara Institute of Science and Technology , JEOL Ltd.
- 申请人地址： 8916-5, Takayamacho Ikoma-shi, Nara 630-0192 JP
- 专利权人： National University Corporation Nara Institute of Science and Technology,JEOL Ltd.
- 当前专利权人： National University Corporation Nara Institute of Science and Technology,JEOL Ltd.
- 当前专利权人地址： 8916-5, Takayamacho Ikoma-shi, Nara 630-0192 JP
- 代理机构： Patentanwälte Lambsdorff & Lange
- 优先权： JP2004208926 20040715
- 国际公布： WO2006008840 20060126
- 主分类号： H01J37/244
- IPC分类号： H01J37/244 ; H01J37/285 ; H01J37/12 ; G01N23/227
摘要：
A mesh (M) having an ellipsoid shape or a shape close to the ellipsoid shape is attached to an electrode (EL1) among electrodes (EL1 to ELn). Voltages of the later-stage electrodes (EL2 to ELn) are appropriately set. With this arrangement, a local negative spherical aberration generated by the mesh (M) is cancelled out with a positive spherical aberration. This optimizes an electric field distribution. As a result, this realizes an electrostatic lens whose acceptance angle is extended to about ±60°.
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