发明公开
- 专利标题： Gas discharge laser system
- 专利标题（中）： 气体放电激光系统
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申请号： EP07009853.8申请日： 1999-05-18
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公开(公告)号： EP1821377A2公开(公告)日： 2007-08-22
- 发明人: Hofmann, Thomas , Hueber, Jean-Marc , Das, Palach P. , Ishihara, Toshihiko , Duffey, Thomas P. , Melchior, John T. , Besaucele, Hervè A. , Morton, Richard G. , Ness, Richard M. , Newman, Peter C. , Partlo, William N. , Rothweil, Daniel A. , Sandstrom, Richard L.
- 申请人： Cymer, Inc.
- 申请人地址： 17075 Thornmint Court San Diego, CA 92127 US
- 专利权人： Cymer, Inc.
- 当前专利权人： Cymer, Inc.
- 当前专利权人地址： 17075 Thornmint Court San Diego, CA 92127 US
- 代理机构： Grünecker, Kinkeldey, Stockmair & Schwanhäusser Anwaltssozietät
- 优先权： US82139 19980520; US157067 19980918; US162341 19980928; US165593 19981002; US206526 19981207; US211825 19981215; US217340 19981221; US271041 19990317
- 主分类号： H01S3/10
- IPC分类号： H01S3/10 ; H01S3/225 ; H01S3/097 ; H01S3/134
摘要：
An apparatus comprising: a gas discharge laser system comprising: a first gas discharge laser producing an output seed laser beam of pulses, comprising a first laser chamber within an oscillator cavity of the first gas discharge laser; a bandwidth selection and line narrowing mechanism within the oscillator cavity of the first gas discharge laser; and a second gas discharge laser for amplifying the seed laser beam pulses.
公开/授权文献
- EP1821377A3 Gas discharge laser system 公开/授权日：2007-10-24
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