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公开(公告)号:EP1821377A3
公开(公告)日:2007-10-24
申请号:EP07009853.8
申请日:1999-05-18
申请人: Cymer, Inc.
发明人: Hofmann, Thomas , Hueber, Jean-Marc , Das, Palach P. , Ishihara, Toshihiko , Duffey, Thomas P. , Melchior, John T. , Besaucele, Hervè A. , Morton, Richard G. , Ness, Richard M. , Newman, Peter C. , Partlo, William N. , Rothweil, Daniel A. , Sandstrom, Richard L.
CPC分类号: G03F7/70358 , G03F7/70025 , G03F7/70041 , G03F7/70558 , G03F7/70575 , H01S3/03 , H01S3/036 , H01S3/041 , H01S3/08009 , H01S3/09702 , H01S3/0971 , H01S3/09713 , H01S3/10092 , H01S3/134 , H01S3/225 , H01S3/2251 , H01S3/2256
摘要: An apparatus comprising: a gas discharge laser system comprising: a first gas discharge laser producing an output seed laser beam of pulses, comprising a first laser chamber within an oscillator cavity of the first gas discharge laser; a bandwidth selection and line narrowing mechanism within the oscillator cavity of the first gas discharge laser; and a second gas discharge laser for amplifying the seed laser beam pulses.
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公开(公告)号:EP1821377A2
公开(公告)日:2007-08-22
申请号:EP07009853.8
申请日:1999-05-18
申请人: Cymer, Inc.
发明人: Hofmann, Thomas , Hueber, Jean-Marc , Das, Palach P. , Ishihara, Toshihiko , Duffey, Thomas P. , Melchior, John T. , Besaucele, Hervè A. , Morton, Richard G. , Ness, Richard M. , Newman, Peter C. , Partlo, William N. , Rothweil, Daniel A. , Sandstrom, Richard L.
CPC分类号: G03F7/70358 , G03F7/70025 , G03F7/70041 , G03F7/70558 , G03F7/70575 , H01S3/03 , H01S3/036 , H01S3/041 , H01S3/08009 , H01S3/09702 , H01S3/0971 , H01S3/09713 , H01S3/10092 , H01S3/134 , H01S3/225 , H01S3/2251 , H01S3/2256
摘要: An apparatus comprising: a gas discharge laser system comprising: a first gas discharge laser producing an output seed laser beam of pulses, comprising a first laser chamber within an oscillator cavity of the first gas discharge laser; a bandwidth selection and line narrowing mechanism within the oscillator cavity of the first gas discharge laser; and a second gas discharge laser for amplifying the seed laser beam pulses.
摘要翻译: 一种设备,包括:气体放电激光系统,包括:第一气体放电激光器,产生脉冲的输出种子激光束,包括在第一气体放电激光器的振荡器腔内的第一激光腔; 第一气体放电激光器的振荡器腔内的带宽选择和线路变窄机构; 以及用于放大种子激光束脉冲的第二气体放电激光器。
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