发明公开
EP1845416A2 Coating compositions for photolithography
审中-公开
BeschichtungszusammensetzungenfürPhotolithographie
- 专利标题： Coating compositions for photolithography
- 专利标题（中）： BeschichtungszusammensetzungenfürPhotolithographie
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申请号： EP07007293.9申请日： 2007-04-10
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公开(公告)号： EP1845416A2公开(公告)日： 2007-10-17
- 发明人: Gallagher, Michael K. , Zampini, Anthony , Ongayi, Owendi
- 申请人： Rohm and Haas Electronic Materials, L.L.C.
- 申请人地址： 455 Forest Street Marlborough, Massachusetts 01752 US
- 专利权人： Rohm and Haas Electronic Materials, L.L.C.
- 当前专利权人： Rohm and Haas Electronic Materials, L.L.C.
- 当前专利权人地址： 455 Forest Street Marlborough, Massachusetts 01752 US
- 代理机构： Buckley, Guy Julian
- 优先权： US791547P 20060411
- 主分类号： G03F7/11
- IPC分类号： G03F7/11
摘要：
In a first aspect, methods are provided that comprise : (a) applying a curable composition on a substrate; (b) applying a hardmask composition above the curable composition; (c) applying a photoresist composition layer above the hard mask composition, wherein one or more of the compositions are removed in an ash-free process. In a second aspect, methods are provided that comprise (a) applying an organic composition on a substrate; (b) applying a photoresist composition layer above the organic composition, wherein the organic composition comprises a material that produce an alkaline-soluble group upon thermal and/or radiation treatment. Related compositions also are provided.
公开/授权文献
- EP1845416A3 Coating compositions for photolithography 公开/授权日：2009-05-20
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