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公开(公告)号：EP1845416A3
公开(公告)日：2009-05-20
申请号：EP07007293.9
申请日：2007-04-10
CPC分类号： G03F7/11 , G03F7/038 , G03F7/039 , G03F7/091 , G03F7/162 , G03F7/168 , G03F7/20 , G03F7/32 , G03F7/322 , G03F7/38 , G03F7/40 , H01L21/0275 , H01L21/0276
摘要： In a first aspect, methods are provided that comprise : (a) applying a curable composition on a substrate; (b) applying a hardmask composition above the curable composition; (c) applying a photoresist composition layer above the hard mask composition, wherein one or more of the compositions are removed in an ash-free process. In a second aspect, methods are provided that comprise (a) applying an organic composition on a substrate; (b) applying a photoresist composition layer above the organic composition, wherein the organic composition comprises a material that produce an alkaline-soluble group upon thermal and/or radiation treatment. Related compositions also are provided.
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公开(公告)号：EP1832929A1
公开(公告)日：2007-09-12
申请号：EP07250991.2
申请日：2007-03-09
发明人： Gallagher, Michael K. , Wang, Deyan
CPC分类号： G03F7/2041 , G03F7/0046 , G03F7/0392 , G03F7/095 , G03F7/11
摘要： Overcoating layer compositions are provided that are applied above a photoresist composition including for immersion lithography processing as well as non-immersion imaging.
摘要翻译： 提供涂覆在光刻胶组合物上的外涂层组合物，其包括用于浸没式光刻加工以及非浸没式成像。
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公开(公告)号：EP1762895A1
公开(公告)日：2007-03-14
申请号：EP06254453.1
申请日：2006-08-25
IPC分类号： G03F7/09
CPC分类号： G03F7/0752 , G03F7/0757 , G03F7/091 , G03F7/11 , H01L21/0276 , H01L21/3081
摘要： The invention includes new organic-containing compositions that can function as an antireflective layer for an overcoated photoresist. Compositions of the invention also can serve effectively as a hard mask layer by exhibiting a sufficient plasma etch selectivity from an undercoated layer. Preferred compositions of the invention have a high Si content and comprise a blend of distinct resins.
摘要翻译： 本发明包括可用作外涂光致抗蚀剂的抗反射层的新的含有机组合物。 通过从底涂层显示出足够的等离子体蚀刻选择性，本发明的组合物也可有效地用作硬掩模层。 本发明优选的组合物具有高Si含量并且包含不同树脂的共混物。
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4.发明公开Compositions comprising an organic polysilica and an arylgroup-capped polyol, and methods for preparing porous organic polysilica films 审中-公开含有有机聚硅和芳端的多元醇组合物以及用于多孔有机膜的聚硅的制备方法
公开(公告)号：EP1632956A1
公开(公告)日：2006-03-08
申请号：EP05255435.9
申请日：2005-09-06
CPC分类号： H01L21/31695 , C08G77/045 , C08G77/12 , C08G77/70 , C08J9/26 , C08J2201/046 , C08J2383/14 , C08L83/04 , C08L83/14 , H01L21/02126 , H01L21/02203 , H01L21/02216 , H01L21/02282 , H01L21/3121 , H01L21/318 , H01L21/7682 , H01L2221/1047 , C08L2666/04
摘要： Compositions useful in the preparation of porous organic polysilica films, particularly for use in the manufacture of integrated circuits, are provided. Methods of forming such compositions and films are also provided.
摘要翻译： 在多孔有机聚硅薄膜，特别是用于在集成电路的制造中使用的制备有用的组合物，提供了。 因此，提供寻求形成组合物和膜的方法。
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5.发明公开
公开(公告)号：EP1845416A2
公开(公告)日：2007-10-17
申请号：EP07007293.9
申请日：2007-04-10
IPC分类号： G03F7/11
CPC分类号： G03F7/11 , G03F7/038 , G03F7/039 , G03F7/091 , G03F7/162 , G03F7/168 , G03F7/20 , G03F7/32 , G03F7/322 , G03F7/38 , G03F7/40 , H01L21/0275 , H01L21/0276
摘要： In a first aspect, methods are provided that comprise : (a) applying a curable composition on a substrate; (b) applying a hardmask composition above the curable composition; (c) applying a photoresist composition layer above the hard mask composition, wherein one or more of the compositions are removed in an ash-free process. In a second aspect, methods are provided that comprise (a) applying an organic composition on a substrate; (b) applying a photoresist composition layer above the organic composition, wherein the organic composition comprises a material that produce an alkaline-soluble group upon thermal and/or radiation treatment. Related compositions also are provided.
摘要翻译： 在第一方面，提供了包括以下步骤的方法：（a）将可固化组合物施加在基材上; （b）在可固化组合物上施加硬掩模组合物; （c）在硬掩模组合物上施加光致抗蚀剂组合物层，其中在无灰过程中除去一种或多种组合物。 在第二方面，提供了包括（a）在基材上施加有机组合物的方法; （b）在有机组合物上施加光致抗蚀剂组合物层，其中有机组合物包括在热和/或辐射处理时产生碱溶性基团的材料。 还提供了相关的组合物。
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公开(公告)号：EP1720075A1
公开(公告)日：2006-11-08
申请号：EP06252320.4
申请日：2006-05-02
CPC分类号： G03F7/091 , C08K3/36 , C09D129/04 , C09D133/02 , G03F7/11 , G03F7/2041
摘要： In one aspect, coating compositions are provided that comprise a component a component that comprises one or more silicon, antimony, aluminum, yttrium, cerium, lanthanum, tin, titanium, zirconium, hafnium, indium or zinc compounds. In another aspect, coating compositions are provided that comprise a plurality of discrete particles. Preferred coating compositions of the invention are useful for antireflective purposes, particularly with an underlaying photoresist coating layer, as well as for a barrier layer in immersion lithography.
摘要翻译： 在一个方面，提供包含组分的涂料组合物，该组分包含一种或多种硅，锑，铝，钇，铈，镧，锡，钛，锆，铪，铟或锌化合物。 在另一方面，提供包含多个离散颗粒的涂料组合物。 本发明优选的涂料组合物可用于抗反射目的，特别是对于底涂光致抗蚀剂涂层以及浸没式光刻中的阻挡层是有用的。
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公开(公告)号：EP1612604A3
公开(公告)日：2006-04-05
申请号：EP05254170.3
申请日：2005-07-01
CPC分类号： G03F7/2041 , G03F7/0046 , G03F7/11
摘要： The present invention relates to barrier layer compositions that are applied above a photoresist composition for immerstom lithography processing. In a further aspect, new methods are provided for immersion lithography processing.
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公开(公告)号：EP1612604A2
公开(公告)日：2006-01-04
申请号：EP05254170.3
申请日：2005-07-01
CPC分类号： G03F7/2041 , G03F7/0046 , G03F7/11
摘要： The present invention relates to barrier layer compositions that are applied above a photoresist composition for immerstom lithography processing. In a further aspect, new methods are provided for immersion lithography processing.
摘要翻译： 本发明涉及应用于用于浸没式光刻加工的光刻胶组合物上的阻挡层组合物。 另一方面，提供了用于浸没式光刻处理的新方法。
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