发明公开
EP1933215A1 MANUFACTURING SYSTEM, MANUFACTURING METHOD, MANAGEMENT DEVICE, MANAGING METHOD, AND PROGRAM
审中-公开
PRODUKTIONSSYSTEM,PRODUKTIONSVERFAHREN,VERWALTUNGSEINRICHTUNG,VERWALTUNGSVERFAHREN UND PROGRAMM
- 专利标题: MANUFACTURING SYSTEM, MANUFACTURING METHOD, MANAGEMENT DEVICE, MANAGING METHOD, AND PROGRAM
- 专利标题(中): PRODUKTIONSSYSTEM,PRODUKTIONSVERFAHREN,VERWALTUNGSEINRICHTUNG,VERWALTUNGSVERFAHREN UND PROGRAMM
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申请号: EP05783449.1申请日: 2005-09-13
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公开(公告)号: EP1933215A1公开(公告)日: 2008-06-18
- 发明人: OKAYASU, Toshiyuki , SUGAWA, Shigetoshi , TERAMOTO, Akinobu
- 申请人: ADVANTEST CORPORATION , National University Corporation Tohoku Unversity
- 申请人地址: 1-32-1, Asahi-cho Nerima-ku, Tokyo 179-0071 JP
- 专利权人: ADVANTEST CORPORATION,National University Corporation Tohoku Unversity
- 当前专利权人: ADVANTEST CORPORATION,National University Corporation Tohoku Unversity
- 当前专利权人地址: 1-32-1, Asahi-cho Nerima-ku, Tokyo 179-0071 JP
- 代理机构: Pfenning, Meinig & Partner GbR
- 国际公布: WO2007032061 20070322
- 主分类号: G05B19/418
- IPC分类号: G05B19/418
摘要:
There is provided a manufacturing system for manufacturing an electronic device through a plurality of manufacturing stages. The manufacturing system includes a plurality of manufacturing apparatuses performing processes corresponding to the plurality of manufacturing stages. The manufacturing system includes a manufacturing line that manufactures the electronic device, a manufacturing control section that causes the manufacturing line to manufacture a wafer having therein a test circuit including a plurality of transistors under measurement, a measuring section that measures an electrical characteristic of each of the plurality of transistors under measurement in the test circuit, an identifying section that identifies, among the plurality of manufacturing stages, a manufacturing stage in which a defect is generated, with reference to a distribution, on the wafer, of one or more transistors under measurement whose electrical characteristics do not meet a predetermined standard, and a setting changing section that changes a setting for a manufacturing apparatus that performs a process corresponding to the manufacturing stage in which the defect is generated.
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