发明公开
EP2110708A1 POSITIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION
有权
LICHTEMPFINDLICHE HARZZUSAMMENSETZUNG DES POSITIVTYPS
- 专利标题： POSITIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION
- 专利标题（中）： LICHTEMPFINDLICHE HARZZUSAMMENSETZUNG DES POSITIVTYPS
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申请号： EP08710777.7申请日： 2008-02-05
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公开(公告)号： EP2110708A1公开(公告)日： 2009-10-21
- 发明人: FUJITA, Yoji , ARIMOTO, Shinji , IKE, Rinsei
- 申请人： Toray Industries, Inc.
- 申请人地址： 1-1, Nihonbashi-Muromachi 2-chome Chuo-ku Tokyo, 103-8666 JP
- 专利权人： Toray Industries, Inc.
- 当前专利权人： Toray Industries, Inc.
- 当前专利权人地址： 1-1, Nihonbashi-Muromachi 2-chome Chuo-ku Tokyo, 103-8666 JP
- 代理机构： Webster, Jeremy Mark
- 优先权： JP2007031710 20070213; JP2007061542 20070312
- 国际公布： WO2008099709 20080821
- 主分类号： G03F7/023
- IPC分类号： G03F7/023 ; C08F290/06 ; C08F299/02 ; C08G73/10 ; C08G73/22 ; G03F7/004 ; G03F7/022 ; H01L21/027
摘要：
[Problem] To provide a positive-type photosensitive resin composition that is produced with novolac resin and has good mechanical properties and high storage stability.
[Means for Solving the Problem] A positive-type photosensitive resin composition, comprising:
(a) a novolac resin;
(b) a polymer comprising, as a main component, a structure represented by formula (1) below and/or a structure represented by formula (2) below:
(wherein formulae (1) and (2), R 1 and R 2 may be the same or different and each represent an organic group having at least two carbon atoms and a valence of 2 to 8, R 3 and R 4 may be the same or different and each represent hydrogen or a monovalent organic group of 1 to 20 carbon atoms, -NH-R 5 in formula (1) and -CO-R 6 in formula (2) each represent a polymer end group, R 5 and R 6 each represent a monovalent organic group having 2 to 30 carbon atoms which includes an unsaturated hydrocarbon group, n is in the range of 10 to 100,000, 1 and m each represent an integer of 0 to 2, and p and q each represent an integer of 0 to 4, provided that p + q > 0;
(c) a quinone diazide compound;
(d) an alkoxymethyl group-containing compound; and
(e) a solvent.
[Means for Solving the Problem] A positive-type photosensitive resin composition, comprising:
(a) a novolac resin;
(b) a polymer comprising, as a main component, a structure represented by formula (1) below and/or a structure represented by formula (2) below:
(wherein formulae (1) and (2), R 1 and R 2 may be the same or different and each represent an organic group having at least two carbon atoms and a valence of 2 to 8, R 3 and R 4 may be the same or different and each represent hydrogen or a monovalent organic group of 1 to 20 carbon atoms, -NH-R 5 in formula (1) and -CO-R 6 in formula (2) each represent a polymer end group, R 5 and R 6 each represent a monovalent organic group having 2 to 30 carbon atoms which includes an unsaturated hydrocarbon group, n is in the range of 10 to 100,000, 1 and m each represent an integer of 0 to 2, and p and q each represent an integer of 0 to 4, provided that p + q > 0;
(c) a quinone diazide compound;
(d) an alkoxymethyl group-containing compound; and
(e) a solvent.
公开/授权文献
- EP2110708B1 POSITIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION 公开/授权日：2012-12-05
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