发明公开
EP2216684A1 Coating compositions suitable for use with an overcoated photoresist
有权
Verfahren zur Herstellung eines fotoresist Bild mit einer Unterschicht
- 专利标题： Coating compositions suitable for use with an overcoated photoresist
- 专利标题（中）： Verfahren zur Herstellung eines fotoresist Bild mit einer Unterschicht
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申请号： EP10152686.1申请日： 2010-02-04
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公开(公告)号： EP2216684A1公开(公告)日： 2010-08-11
- 发明人: Cameron, James F. , Sung, Jin Wuk , Amara, John P. , Prokopowicz, Gregory P. , Valeri, David A. , Vyklicky, Libor , Huang, Wu-Song S. , Li, Wenjie , Varanasi, Pushkara R. , Popova, Irene Y.
- 申请人： Rohm and Haas Electronic Materials LLC
- 申请人地址： 455 Forest Street Marlborough, MA 01752 US
- 专利权人： Rohm and Haas Electronic Materials LLC
- 当前专利权人： Rohm and Haas Electronic Materials LLC
- 当前专利权人地址： 455 Forest Street Marlborough, MA 01752 US
- 代理机构： Buckley, Guy Julian
- 优先权： US207201P 20090208
- 主分类号： G03F7/09
- IPC分类号： G03F7/09 ; G03F7/20 ; G03F7/11
摘要：
Organic coating compositions, particularly antireflective coating compositions, are provided that can be developed with an aqueous alkaline developer, including in a single step during development of an overcoated photoresist layer. Preferred coating compositions comprise a tetrapolymer that comprises at least four distinct functional groups.
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