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1.发明公开
公开(公告)号：EP2216683A3
公开(公告)日：2011-06-01
申请号：EP10152673.9
申请日：2010-02-04
IPC分类号： G03F7/09 , C08F220/36
CPC分类号： G03F7/091 , B05D1/005 , B05D3/0254 , B05D3/06 , B05D5/061 , B05D7/54 , C08F220/36 , C09D5/006 , C09D133/12 , G03F7/11 , G03F7/16 , G03F7/20 , G03F7/322
摘要： Organic coating compositions, particularly antireflective coating compositions, are provided that comprise that comprise a diene/dienophile reaction product. Preferred compositions of the invention are useful to reduce reflection of exposing radiation from a substrate back into an overcoated photoresist layer and/or function as a planarizing, conformal or via-fill layer.
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2.发明公开Coating compositions suitable for use with an overcoated photoresist 有权Verfahren zur Herstellung eines fotoresist Bild mit einer Unterschicht
公开(公告)号：EP2216684A1
公开(公告)日：2010-08-11
申请号：EP10152686.1
申请日：2010-02-04
发明人： Cameron, James F. , Sung, Jin Wuk , Amara, John P. , Prokopowicz, Gregory P. , Valeri, David A. , Vyklicky, Libor , Huang, Wu-Song S. , Li, Wenjie , Varanasi, Pushkara R. , Popova, Irene Y.
摘要： Organic coating compositions, particularly antireflective coating compositions, are provided that can be developed with an aqueous alkaline developer, including in a single step during development of an overcoated photoresist layer. Preferred coating compositions comprise a tetrapolymer that comprises at least four distinct functional groups.
摘要翻译： 提供了可以用含水碱性显影剂显影的有机涂料组合物，特别是抗反射涂料组合物，包括在外涂光致抗蚀剂层的显影过程中的单一步骤。 优选的涂料组合物包含包含至少四个不同官能团的四元共聚物。
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公开(公告)号：EP2071400A1
公开(公告)日：2009-06-17
申请号：EP08168807.9
申请日：2008-11-11
CPC分类号： G03F7/091 , G03F7/0752
摘要： In one aspect, the invention relates to silicon-containing organic coating compositions, particularly antireflective coating compositions, that contain a repeat unit wherein chromophore moieties such as phenyl are spaced from Si atom(s). In another aspect, silicon-containing underlayer compositions are provided that are formulated as a liquid (organic solvent) composition, where at least one solvent of the solvent component comprise hydroxy groups.
摘要翻译： 一方面，本发明涉及含有重复单元的含硅有机涂料组合物，特别是抗反射涂料组合物，其中发色团部分例如苯基与Si原子间隔开。 另一方面，提供配制成液体（有机溶剂）组合物的含硅底层组合物，其中溶剂组分的至少一种溶剂包含羟基。
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公开(公告)号：EP2216683B1
公开(公告)日：2018-11-14
申请号：EP10152673.9
申请日：2010-02-04
IPC分类号： G03F7/09 , C08F220/36
CPC分类号： G03F7/091 , B05D1/005 , B05D3/0254 , B05D3/06 , B05D5/061 , B05D7/54 , C08F220/36 , C09D5/006 , C09D133/12 , G03F7/11 , G03F7/16 , G03F7/20 , G03F7/322
摘要： Organic coating compositions, particularly antireflective coating compositions, are provided that comprise that comprise a diene/dienophile reaction product. Preferred compositions of the invention are useful to reduce reflection of exposing radiation from a substrate back into an overcoated photoresist layer and/or function as a planarizing, conformal or via-fill layer.
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公开(公告)号：EP2216684B1
公开(公告)日：2015-10-07
申请号：EP10152686.1
申请日：2010-02-04
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公开(公告)号：EP2261738A3
公开(公告)日：2011-04-13
申请号：EP10165624.7
申请日：2010-06-11
IPC分类号： G03F7/09 , C08F220/36
CPC分类号： C09D5/006 , C07C69/76 , C07C69/94 , C08F220/36 , C09D133/14 , G03F7/091 , G03F7/16 , G03F7/168 , G03F7/20 , G03F7/322 , H01L21/0276
摘要： In one aspect, organic coating compositions, particularly antireflective coating compositions, are provided that comprise that comprise a diene/dienophile reaction product. In another aspect, organic coating compositions, particularly antireflective coating compositions, are provided that comprise a component comprising a hydroxyl-naphthoic group, such as a 6-hydroxy-2-naphthoic group Preferred compositions of the invention are useful to reduce reflection of exposing radiation from a substrate back into an overcoated photoresist layer and/or function as a planarizing, conformal or via-fill layer.
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7.发明公开Coating compositions suitable for use with an overcoated photoresist 审中-公开Beschichtungszusammensetzungen，死者zur Beschichtung eines Photoresists eignen
公开(公告)号：EP2261738A2
公开(公告)日：2010-12-15
申请号：EP10165624.7
申请日：2010-06-11
IPC分类号： G03F7/09 , C08F220/36
CPC分类号： C09D5/006 , C07C69/76 , C07C69/94 , C08F220/36 , C09D133/14 , G03F7/091 , G03F7/16 , G03F7/168 , G03F7/20 , G03F7/322 , H01L21/0276
摘要： In one aspect, organic coating compositions, particularly antireflective coating compositions, are provided that comprise that comprise a diene/dienophile reaction product. In another aspect, organic coating compositions, particularly antireflective coating compositions, are provided that comprise a component comprising a hydroxyl-naphthoic group, such as a 6-hydroxy-2-naphthoic group Preferred compositions of the invention are useful to reduce reflection of exposing radiation from a substrate back into an overcoated photoresist layer and/or function as a planarizing, conformal or via-fill layer.
摘要翻译： 一方面，提供了包含二烯/亲二烯体反应产物的有机涂料组合物，特别是抗反射涂料组合物。 在另一方面，提供了包含包含羟基 - 萘甲酸基团的组分的有机涂料组合物，特别是抗反射涂料组合物，例如6-羟基-2-萘甲酸基团。本发明的优选组合物可用于减少曝光辐射的反射 从衬底返回到外涂光致抗蚀剂层和/或用作平坦化，共形或通孔填充层。
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