发明公开
EP2400344A1 Positive photosensitive resin composition
审中-公开
积极的lichtempfindliche Harzzusammensetzung
- 专利标题： Positive photosensitive resin composition
- 专利标题（中）： 积极的lichtempfindliche Harzzusammensetzung
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申请号： EP11166082.5申请日： 2011-05-13
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公开(公告)号： EP2400344A1公开(公告)日： 2011-12-28
- 发明人: Li, Yen-Cheng , Chou, Nai-Tien , Wei, Jung-Hsin
- 申请人： Everlight USA, Inc.
- 申请人地址： 10570 Southern Loop Boulevard Pineville, North Carolina 28134 US
- 专利权人： Everlight USA, Inc.
- 当前专利权人： Everlight USA, Inc.
- 当前专利权人地址： 10570 Southern Loop Boulevard Pineville, North Carolina 28134 US
- 代理机构： Epping - Hermann - Fischer
- 优先权： TW099121014 20100628
- 主分类号： G03F7/023
- IPC分类号： G03F7/023 ; H05K3/10
摘要：
The present invention provides a positive photosensitive resin composition, including an alkali soluble phenolic resin; an alkali soluble acrylic resin; and a photosensitive compound having quinone diazide. The positive photosensitive resin composition is applicable to a semi-additive process for forming tiny and fine wirings.
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