发明公开
EP2454394A1 A METHOD OF INHIBITING FORMATION OF DEPOSITS IN A MANUFACTURING SYSTEM
审中-公开
用于抑制沉积物的形成在生产系统
- 专利标题: A METHOD OF INHIBITING FORMATION OF DEPOSITS IN A MANUFACTURING SYSTEM
- 专利标题(中): 用于抑制沉积物的形成在生产系统
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申请号: EP10737413.4申请日: 2010-07-14
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公开(公告)号: EP2454394A1公开(公告)日: 2012-05-23
- 发明人: DEHTIAR, Max , GIARDINA, Jason , VANDERHOVEL, Jaime , HOFMEISTER, Michael , MOLNAR, Michael, John , STRATTON, Robert, E. , PAWELKOWSKI, Stephen
- 申请人: Hemlock Semiconductor Corporation
- 申请人地址: 12334 Geddes Road Mail Code 090-23 Hemlock, MI 48626 US
- 专利权人: Hemlock Semiconductor Corporation
- 当前专利权人: Hemlock Semiconductor Corporation
- 当前专利权人地址: 12334 Geddes Road Mail Code 090-23 Hemlock, MI 48626 US
- 代理机构: Thomson, Craig Richard
- 优先权: US225347P 20090714
- 国际公布: WO2011008849 20110120
- 主分类号: C23C16/44
- IPC分类号: C23C16/44 ; C23C16/458 ; C23C16/52 ; F25B43/00 ; F25B47/00 ; C23C16/24
摘要:
A method inhibits formation of deposits on a cooling surface of an electrode. The electrode is used in a manufacturing system that deposits a material on a carrier body. The cooling surface comprises copper. The system includes a reactor defining a chamber. The electrode is at least partially disposed within the chamber and supports the carrier body. A circulation system, in fluid communication with the electrode, transports a coolant composition to and from the cooling surface. The coolant composition comprises a coolant and dissolved copper from the cooling surface. A filtration system is in fluid communication with the circulation system. The method heats the electrode. The cooling surface of the electrode is contacted with the coolant composition. The material is deposited on the carrier body, and the coolant composition is filtered with the filtration system to remove at least a portion of the dissolved copper therefrom.
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