发明公开
EP2470958A4 ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING PATTERN USING THE COMPOSITION
审中-公开
光化辐射敏感性树脂组合物及结构形成方法使用该组合物
- 专利标题： ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING PATTERN USING THE COMPOSITION
- 专利标题（中）： 光化辐射敏感性树脂组合物及结构形成方法使用该组合物
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申请号： EP10812107申请日： 2010-08-27
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公开(公告)号： EP2470958A4公开(公告)日： 2014-03-26
- 发明人: KATAOKA SHOHEI , SHIBUYA AKINORI , YAMAGUCHI SHUHEI , TOMEBA HISAMITSU
- 申请人： FUJIFILM CORP
- 专利权人： FUJIFILM CORP
- 当前专利权人： FUJIFILM CORP
- 优先权： JP2009198729 2009-08-28; JP2009232799 2009-10-06
- 主分类号： G03F7/004
- IPC分类号： G03F7/004 ; G03F7/039 ; G03F7/075 ; G03F7/11 ; G03F7/20 ; H01L21/027
摘要：
According to one embodiment, an actinic-ray- or radiation-sensitive resin composition includes any of the compounds of general formula (I) below, a compound that when exposed to actinic rays or radiation, generates an acid and a hydrophobic resin. (The characters used in general formula (I) have the meanings mentioned in the description.) RN-A−X+ (I)
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