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    ACTIVE LIGHT SENSITIVE OR RADIATION SENSITIVE RESIN COMPOSITION, ACTIVE LIGHT SENSITIVE OR RADIATION SENSITIVE FILM, MASK BLANK PROVIDED WITH ACTIVE LIGHT SENSITIVE OR RADIATION SENSITIVE FILM, PHOTOMASK, PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE
    2.
    发明公开
    ACTIVE LIGHT SENSITIVE OR RADIATION SENSITIVE RESIN COMPOSITION, ACTIVE LIGHT SENSITIVE OR RADIATION SENSITIVE FILM, MASK BLANK PROVIDED WITH ACTIVE LIGHT SENSITIVE OR RADIATION SENSITIVE FILM, PHOTOMASK, PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE 审中-公开
    AKTIVE LICHTEMPFINDLICHE ODER STRAHLUNGSEMPFINDLICHE HARZZUSAMMENSETZUNG，AKTIVE LICHTEMPFINDLICHE ODER STRAHLUNGSEMPFINDLICHE FOLIE，MASKENROHLING麻省理工学院DER AKTIVEN LICHTEMPFINDLICHEN ODER STRAHLUNGSEMPFINDLICHEN FOLIE，FOTOMASKE，STRUKTURBILDUNGSVERFAHREN，VERFAHREN ZUR HERSTELLUNG EINER ELEKTRONISCHEN VORRICHTUNG UND ELEKTRONISCHE VORRICHTUNG

    公开(公告)号：EP3106920A4

    公开(公告)日：2017-04-26

    申请号：EP14881770

    申请日：2014-12-11

    申请人： FUJIFILM CORP

    发明人： TAKAHASHI KOUTAROU ,  TSUCHIMURA TOMOTAKA ,  YAMAGUCHI SHUHEI ,  YOKOKAWA NATSUMI ,  MOCHIZUKI HIDEHIRO

    IPC分类号： G03F7/004 ,  G03F7/038

    CPC分类号： G03F7/038 ,  G03F1/24 ,  G03F1/50 ,  G03F1/78 ,  G03F7/0382 ,  G03F7/2059 ,  G03F7/32

    摘要： An actinic ray-sensitive or radiation-sensitive resin composition includes an alkali-soluble resin (A) having a phenolic hydroxyl group, and a crosslinking agent (C) having two or more hydroxymethyl groups or alkoxymethyl groups in total within the molecule, wherein the composition contains a crosslinking agent (C1) having a molecular weight of 420 or more and also having two to four hydroxymethyl groups or alkoxymethyl groups in total within the molecule in a proportion of 60 mol% to 100 mol% based on the total amount of the crosslinking agent (C) including the crosslinking agent (C1), and in which the total concentration of the hydroxymethyl groups or the alkoxymethyl groups of the crosslinking agent (C) relative to 1 g of the solid content in the actinic ray-sensitive or radiation-sensitive resin composition is 0.30 mmol/g or more.

    摘要翻译： 光化射线敏感或辐射敏感树脂组合物包括分子内总共具有两个或更多个羟甲基或烷氧基甲基的具有酚羟基的碱溶性树脂（A）和交联剂（C），其中 组合物含有分子量为420以上且在分子内总共具有2至4个羟甲基或烷氧基甲基的交联剂（C1），其比例为60摩尔％至100摩尔％，基于 包含交联剂（C1）的交联剂（C），并且其中交联剂（C）的羟甲基或烷氧基甲基的总浓度相对于1g光化射线敏感或辐射中的固体含量 感光性树脂组合物的含量为0.30mmol / g以上。