发明公开
EP2527379A1 Polymer and photoresist comprising the polymer
审中-公开
Polymer und Fotolack mit dem Polymer
- 专利标题： Polymer and photoresist comprising the polymer
- 专利标题（中）： Polymer und Fotolack mit dem Polymer
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申请号： EP12168975.6申请日： 2012-05-22
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公开(公告)号： EP2527379A1公开(公告)日： 2012-11-28
- 发明人: Prokopowicz, Gregory P. , Pohlers, Gerhard , Li, Mingqi , Wu, Chunyi , Liu, Cong , Xu, Cheng-Bai
- 申请人： Rohm and Haas Electronic Materials LLC
- 申请人地址： 455 Forest Street Marlborough, MA 01752 US
- 专利权人： Rohm and Haas Electronic Materials LLC
- 当前专利权人： Rohm and Haas Electronic Materials LLC
- 当前专利权人地址： 455 Forest Street Marlborough, MA 01752 US
- 代理机构： Buckley, Guy Julian
- 优先权： US201161490883P 20110527
- 主分类号： C08F220/26
- IPC分类号： C08F220/26 ; C08F214/18 ; G03F7/004 ; G03F7/039
摘要：
A copolymer comprises the polymerised product of a base-soluble monomer of formula (I):
wherein R a is H, F, C 1-10 alkyl, or C 1-10 fluoroalkyl, L 1 is an m valent C 2-30 alkylene, C 3-30 cycloalkylene, C 6-30 arylene, C 7-30 aralkylene group, X 1 is independently a base-soluble organic group comprising β-diketone, β-ester-ketone, β-di-ester, or a combination comprising at least one of the foregoing; and an additional monomer copolymerizable with the base-soluble monomer of formula (I).
A coated film comprises the photoresist comprising the copolymer.
wherein R a is H, F, C 1-10 alkyl, or C 1-10 fluoroalkyl, L 1 is an m valent C 2-30 alkylene, C 3-30 cycloalkylene, C 6-30 arylene, C 7-30 aralkylene group, X 1 is independently a base-soluble organic group comprising β-diketone, β-ester-ketone, β-di-ester, or a combination comprising at least one of the foregoing; and an additional monomer copolymerizable with the base-soluble monomer of formula (I).
A coated film comprises the photoresist comprising the copolymer.
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