发明公开
EP2556044A1 NORBORNENE-TYPE POLYMERS, COMOSITIONS THEREOF AND LITHOGRAPHIC PROCESS USING SUCH COMPOSITIONS
审中-公开
降冰片烯，THEREOF组合物和此类组合物中的光刻工艺
- 专利标题： NORBORNENE-TYPE POLYMERS, COMOSITIONS THEREOF AND LITHOGRAPHIC PROCESS USING SUCH COMPOSITIONS
- 专利标题（中）： 降冰片烯，THEREOF组合物和此类组合物中的光刻工艺
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申请号： EP11715344.5申请日： 2011-04-05
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公开(公告)号： EP2556044A1公开(公告)日： 2013-02-13
- 发明人: KANDANARACHCHI, Pramod , FUJITA, Kazuyoshi , SMITH, Steven , RHODES, Larry, F.
- 申请人： Promerus, LLC , Sumitomo Bakelite Co., Ltd.
- 申请人地址： 9921 Brecksville Road Brecksville, OH 44141 US
- 专利权人： Promerus, LLC,Sumitomo Bakelite Co., Ltd.
- 当前专利权人： Promerus, LLC,Sumitomo Bakelite Co., Ltd.
- 当前专利权人地址： 9921 Brecksville Road Brecksville, OH 44141 US
- 代理机构： von Kreisler Selting Werner
- 优先权： US341810P 20100405
- 国际公布： WO2011127014 20111013
- 主分类号： C07C205/03
- IPC分类号： C07C205/03 ; C08F24/00 ; C08F28/06 ; C08F32/00 ; C08F232/08 ; C08G61/08 ; G03C5/00 ; G03F7/004 ; G03F7/038 ; G03F7/039 ; G03F7/11 ; G03F7/20
摘要：
Embodiments in accordance with the present invention provide for non-self imageable norbornene-type polymers useful for immersion lithographic processes, methods of making such polymers, compositions employing such polymers and immersion lithographic processes that make use of such compositions. More specifically the embodiments of the present invention are related to norbornene-type polymers useful for forming top-coat layers for overlying photoresist layers in immersion lithographic process and the process thereof.
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