发明公开
EP2624022A1 REFLECTING BASE MATERIAL, BACKLIGHT UNIT, AND METHOD FOR MANUFACTURING REFLECTING BASE MATERIAL
审中-公开
参考文献基础，RÜCKBELEUCHTUNGSEINHEITUND VERFAHREN ZUR HERSTELLUNG DES REFLEKTIEREN BASISMATERIALS
- 专利标题： REFLECTING BASE MATERIAL, BACKLIGHT UNIT, AND METHOD FOR MANUFACTURING REFLECTING BASE MATERIAL
- 专利标题（中）： 参考文献基础，RÜCKBELEUCHTUNGSEINHEITUND VERFAHREN ZUR HERSTELLUNG DES REFLEKTIEREN BASISMATERIALS
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申请号： EP11828742.4申请日： 2011-09-08
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公开(公告)号： EP2624022A1公开(公告)日： 2013-08-07
- 发明人: NISHIWAKI, Toshimitsu , MORITA, Nobuyuki , ISHIKAWA, Akihiko , YAMANE, Motohiro , HAYASHI, Daisuke , KAWAI, Koichi , SATOH, Yusuke
- 申请人： Furukawa Electric Co., Ltd.
- 申请人地址： 2-3, Marunouchi 2-chome Chiyoda-ku Tokyo 100-8322 JP
- 专利权人： Furukawa Electric Co., Ltd.
- 当前专利权人： Furukawa Electric Co., Ltd.
- 当前专利权人地址： 2-3, Marunouchi 2-chome Chiyoda-ku Tokyo 100-8322 JP
- 代理机构： Buchetmann, Dominik
- 优先权： JP2010215750 20100927
- 国际公布： WO2012043181 20120405
- 主分类号： G02B5/08
- IPC分类号： G02B5/08 ; B32B3/30 ; B32B5/18 ; B32B7/02 ; F21V7/00 ; G02F1/13357
摘要：
A reflecting base material that can reliably prevent the occurrence of uneven brightness, a backlight unit that uses the same, and a method for manufacturing the same are provided. Surface profile information of the reflecting base material 7 is obtained by a laser displacement gauge 3. Next, the unevenness information obtained is subjected to Fourier transform, and the relationship between frequency and intensity for the surface unevenness profile of the reflecting base material is obtained. Next, the calculated relationship between the frequency and intensity is compared with a preset standard data. When the intensity exceeds 0.6 at a predetermined range of frequency domain, a judgment of rejection is made; when no data exceeding 0.6 exists in said judgment domain, a judgment of acceptance is made.
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