发明公开
EP2702603A2 METHOD AND APPARATUS FOR PROCESSING A SUBSTRATE WITH A FO-CUSSED PARTICLE BEAM 审中-公开
方法和装置用于处理基板用聚焦粒子束

METHOD AND APPARATUS FOR PROCESSING A SUBSTRATE WITH A FO-CUSSED PARTICLE BEAM
摘要:
The invention relates to a method for processing a substrate with a focussed particle beam which incidents on the substrate, the method comprising the steps of: (a) generating at least one reference mark on the substrate using the focused particle beam and at least one processing gas, (b) determining a reference position of the at least one reference mark, (c) processing the substrate using the reference position of the reference mark, and (d) removing the at least one reference mark from the substrate.
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