发明公开
EP2763158A1 REFLECTIVE MASK BLANK, REFLECTIVE MASK, AND METHODS FOR MANUFACTURING REFLECTIVE MASK BLANK AND REFLECTIVE MASK
审中-公开
反射型掩模中，用于制造反射型掩模和反射掩模反射掩模和方法
- 专利标题： REFLECTIVE MASK BLANK, REFLECTIVE MASK, AND METHODS FOR MANUFACTURING REFLECTIVE MASK BLANK AND REFLECTIVE MASK
- 专利标题（中）： 反射型掩模中，用于制造反射型掩模和反射掩模反射掩模和方法
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申请号： EP12835771.2申请日： 2012-09-25
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公开(公告)号： EP2763158A1公开(公告)日： 2014-08-06
- 发明人: TANABE, Masahito , FUKUGAMI, Norihito , SAKATA, Yo , KOMIZO, Tooru , HARAGUCHI, Takashi
- 申请人： Toppan Printing Co., Ltd.
- 申请人地址： Taitoh 1-5-1 Taitoh-ku Tokyo 110-0016 JP
- 专利权人： Toppan Printing Co., Ltd.
- 当前专利权人： Toppan Printing Co., Ltd.
- 当前专利权人地址： Taitoh 1-5-1 Taitoh-ku Tokyo 110-0016 JP
- 代理机构： TBK
- 优先权： JP2011213244 20110928; JP2011214573 20110929
- 国际公布： WO2013046641 20130404
- 主分类号： H01L21/027
- IPC分类号： H01L21/027 ; G03F1/24
摘要：
An objective is to provide a reflective mask blank, a reflective mask, and methods for manufacturing those, suppress reflectance at a light-shielding frame, and improve quality.
The reflective mask includes a substrate, a multilayered reflective layer formed on the substrate, an absorption layer formed on the multilayered reflective layer, and a frame-shaped light-shielding frame area at which the absorption layer has a film thickness larger than a film thickness at other areas. The multilayered reflective layer is diffused and mixed at the light-shielding frame area through melting.
The reflective mask includes a substrate, a multilayered reflective layer formed on the substrate, an absorption layer formed on the multilayered reflective layer, and a frame-shaped light-shielding frame area at which the absorption layer has a film thickness larger than a film thickness at other areas. The multilayered reflective layer is diffused and mixed at the light-shielding frame area through melting.
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