发明公开
EP2810127A1 SUBSTRATE HOLDER AND METHOD OF MANUFACTURING A SUBSTRATE HOLDER
审中-公开
VERFAHREN ZUR HERSTELLUNG EINES SUBSTRATHALTERS的SUBSTRATHALTER
- 专利标题： SUBSTRATE HOLDER AND METHOD OF MANUFACTURING A SUBSTRATE HOLDER
- 专利标题（中）： VERFAHREN ZUR HERSTELLUNG EINES SUBSTRATHALTERS的SUBSTRATHALTER
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申请号： EP13700401.6申请日： 2013-01-17
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公开(公告)号： EP2810127A1公开(公告)日： 2014-12-10
- 发明人: LAFARRE, Raymond , DONDERS, Sjoerd , TEN KATE, Nicolaas , DZIOMKINA, Nina , KARADE, Yogesh , RODENBURG, Elisabeth
- 申请人： ASML Netherlands B.V.
- 申请人地址： P.O. Box 324 5500 AH Veldhoven NL
- 专利权人： ASML Netherlands B.V.
- 当前专利权人： ASML Netherlands B.V.
- 当前专利权人地址： P.O. Box 324 5500 AH Veldhoven NL
- 代理机构： Corcoran, Gregory Martin Mason
- 优先权： US201261594857P 20120203; US201261621648P 20120409; US201261621660P 20120409
- 国际公布： WO2013113569 20130808
- 主分类号： G03F7/20
- IPC分类号： G03F7/20
摘要：
A substrate holder for use in a lithographic apparatus. The substrate holder comprises a main body (400) and a plurality of burls provided on the main body and having end surfaces to support a substrate. The burls each comprise a lower portion (406a) protruding from the main body and an upper portion (406b) above the lower portion. The lower portions are a different material than the upper portions, the upper portions comprise diamond-like carbon, and the upper portions are separated from each other.
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