发明公开
EP2871523A1 POSITIVE PHOTOSENSITIVE COMPOSITION, THIN FILM TRANSISTOR, AND COMPOUND
审中-公开
VERBINDUNG的DÜNNFILMTRANSISUNG正面LICHTEMPFINDLICHE ZUSAMMENSETZUNG
- 专利标题： POSITIVE PHOTOSENSITIVE COMPOSITION, THIN FILM TRANSISTOR, AND COMPOUND
- 专利标题（中）： VERBINDUNG的DÜNNFILMTRANSISUNG正面LICHTEMPFINDLICHE ZUSAMMENSETZUNG
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申请号： EP13812927.5申请日： 2013-07-02
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公开(公告)号： EP2871523A1公开(公告)日： 2015-05-13
- 发明人: IDE, Masahito , INARI, Hirofumi , KITAJIMA, Aki , TAHARA, Komei , MANABE, Takao
- 申请人： Kaneka Corporation
- 申请人地址： 2-3-18, Nakanoshima, Kita-ku, Osaka 530-8288 JP
- 专利权人： Kaneka Corporation
- 当前专利权人： Kaneka Corporation
- 当前专利权人地址： 2-3-18, Nakanoshima, Kita-ku, Osaka 530-8288 JP
- 代理机构： Vossius & Partner Patentanwälte Rechtsanwälte mbB
- 优先权： JP2012150354 20120704; JP2012230873 20121018; JP2012272734 20121213; JP2012282900 20121226; JP2013063936 20130326
- 国际公布： WO2014007231 20140109
- 主分类号： G03F7/075
- IPC分类号： G03F7/075 ; G03F7/004 ; G03F7/039
摘要：
The present invention aims to provide positive photosensitive compositions that have excellent patterning properties and can exhibit excellent electrical insulation reliability when cured (as thin films). The positive photosensitive composition according to a first aspect of the present invention is characterized by including (A) a compound that contains an alkenyl group or a SiH group within a molecule and has a structure that decomposes in the presence of acid to generate an acidic group or a hydroxyl group; (B) a compound that contains a SiH group or an alkenyl group within a molecule; (C) a hydrosilylation catalyst; and (D) a photoacid generator.
公开/授权文献
- EP2871523B1 POSITIVE PHOTOSENSITIVE COMPOSITION AND THIN FILM TRANSISTOR 公开/授权日：2019-05-08
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