摘要:
The technique of preparing a semiconductive rubber by adding a conductivity imparting agent to resin matrix is so general but controlling the exhibiting conductive properties to a semiconductive range is difficult and in the technique of imparting conductivity by using an electronic conductive agent such as carbon black, uniform dispersion within the system is difficult and this often causes the problems of the sample fluctuation of the electric properties and voltage dependency of the obtained semiconductive rubber. The semiconductive resin composition of the present invention comprises (A) an oxyalkylene polymer having at least one hydrosilylizable alkenyl group in each molecule, (B) a compound having at least two hydrosilyl groups in each molecule, (C) a hydrosilylizing catalyst, and (D) an ionic conductivity imparting agent or (E) a nonionic surfactant. The present invention also provides a semiconductive member having an extremely small fluctuation of resistance due to voltage applied and environment and small change in resistance due to continuous use, which is suitable for electrophotographic devices. The semiconductive member of the present invention comprises a metallic supporting member, a semiconductive elastic layer formed around the exterior of the metallic supporting member and at least one surface layer formed around the exterior of the semiconductive elastic layer, wherein the member has a specific resistance and resistance ratio.
摘要:
According to the present invention, a flame retardant can be obtained, which provides a thermoplastic resin composition excellent in flame retardancy and impact resistance, and by compounding this flame retardant in thermoplastic resin, a flame retardant resin composition excellent in flame retardancy and impact resistance can be obtained. The present invention relates to a graft copolymer containing polyorganosiloxane obtained by polymerizing 0 to 10 parts by weight of a vinyl monomer (B) comprising 100 to 20 % by weight of a multi-functional monomer containing at least two polymerizable unsaturated bonds in a molecule (b-1) and 0 to 80 % by weight of another copolymerizable monomer (b-2) and 5 to 70 parts by weight of a vinyl monomer (C), in the presence of 30 to 95 parts by weight of polyorganosiloxane in a latex state (A), so that the total amount of polyorganosiloxane (A), vinyl monomer (B) and vinyl monomer (C) becomes 100 parts by weight. Also, according to the present invention, in a process for preparing an emulsion of polyorganosiloxane, polymerization conversion ratio can be improved. The present invention relates to a process for preparing an emulsion of polyorganosiloxane, which comprises obtaining polyorganosiloxane (H) by emulsion polymerizing cyclic organosiloxane under acidic conditions of pH of at most 5 and adding condensation reactive organosilane represented by formula (I):
R 1 n Si(OR 2 ) (4-n) (1)
(wherein R 1 represents an organic group, R 2 represents a hydrogen atom or an alkyl group having 1 to 5 carbon atoms, n represents an integer of 0 to 3) or a partially hydrolyzed condensate thereof (I).
摘要:
The present invention aims to provide positive photosensitive compositions that have excellent patterning properties and can exhibit excellent electrical insulation reliability when cured (as thin films). The positive photosensitive composition according to the present invention is characterized by including (G) a compound having a structure represented by formula (X1) or (X2); (H) a compound having a structure that decomposes in the presence of acid to generate an acidic group or a hydroxyl group; and (D) a photoacid generator, the formulas (X1) and (X2) respectively being:
摘要:
The present invention has its object to provide a liquid-form modified product of polyhedral polysiloxane which is excellent in moldability and transparency, and a composition produced using the modified product. In addition, the present invention can provide an easy-to-handle modified product and composition. The present invention provides a modified product of polyhedral polysiloxane which is obtainable by modifying a polyhedral polysiloxane compound (a) with a compound (b), and a composition containing the modified product. The polyhedral polysiloxane compound (a) has an alkenyl group and/or a hydrosilyl group, and the compound (b) has a hydrosilyl group and/or an alkenyl group each capable of hydrosilylation with the component (a).
摘要:
It is an object of the present invention to provide: a curable composition that has photocurability and provides a cured product excellent in insulating properties; and the cured product. This can be achieved by a photocurable composition that contains, as essential components, (A) a modified polyorganosiloxane compound having a photopolymerizable functional group and an SiH group, (B) a compound having a carbon-carbon double bond, and (C) a photopolymerization initiator. A thin film produced from the curable composition of the present invention has excellent insulating properties. Since the curable composition of the present invention can form a film by solution coating, it is applicable to provide thin-film insulating materials that can be formed by solution coating.
摘要:
An object of the present invention is to provide a polysiloxane compound that can be developed in an aqueous alkali solution and can yield a cured product or thin film having superior heat-resistant transparency and insulating properties, a curable composition thereof, and a thin film transistor provided with a passivation layer or gate insulator using the same, and the present invention relates to a polysiloxane compound having at least one photopolymerizable functional group in a molecule thereof, and having at least one member selected from the group consisting of an isocyanuric acid backbone structure, a phenolic hydroxyl group and a carboxyl group within the same molecule, to a curable composition containing the polysiloxane compound, and to a cured product thereof.
摘要:
A photosensitive composition contains a polysiloxane compound, a photoacid generator, a coloring agent and a solvent. A content of the coloring agent with respect to a total solid content of the composition is 5% by weight or more. The polysiloxane compound contains a cyclic polysiloxane structure and a cationically polymerizable functional group. The polysiloxane compound may further have an alkali-soluble functional group. A content of the polysiloxane compound with respect to the total solid content of the composition is preferably 20 to 80% by weight. The photosensitive composition is used, for example, in formation of a colored pattern.
摘要:
The present invention aims to provide positive photosensitive compositions that have excellent patterning properties and can exhibit excellent electrical insulation reliability when cured (as thin films). The positive photosensitive composition according to a first aspect of the present invention is characterized by including (A) a compound that contains an alkenyl group or a SiH group within a molecule and has a structure that decomposes in the presence of acid to generate an acidic group or a hydroxyl group; (B) a compound that contains a SiH group or an alkenyl group within a molecule; (C) a hydrosilylation catalyst; and (D) a photoacid generator.