发明授权
EP2993521B1 CHEMICALLY AMPLIFIED POSITIVE RESIST DRY FILM, DRY FILM LAMINATE AND METHOD OF PREPARING LAMINATE
有权
化学增强正涂料干膜,干膜层压结构及其制造方法层压
- 专利标题: CHEMICALLY AMPLIFIED POSITIVE RESIST DRY FILM, DRY FILM LAMINATE AND METHOD OF PREPARING LAMINATE
- 专利标题(中): 化学增强正涂料干膜,干膜层压结构及其制造方法层压
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申请号: EP15182701.1申请日: 2015-08-27
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公开(公告)号: EP2993521B1公开(公告)日: 2017-03-22
- 发明人: HIRANO, Yoshinori , ASAI, Satoshi , YANAGISAWA, Hideyoshi
- 申请人: Shin-Etsu Chemical Co., Ltd.
- 申请人地址: 6-1, Ohtemachi 2-chome Chiyoda-ku Tokyo JP
- 专利权人: Shin-Etsu Chemical Co., Ltd.
- 当前专利权人: Shin-Etsu Chemical Co., Ltd.
- 当前专利权人地址: 6-1, Ohtemachi 2-chome Chiyoda-ku Tokyo JP
- 代理机构: Ter Meer Steinmeister & Partner
- 优先权: JP2014182423 20140908
- 主分类号: G03F7/039
- IPC分类号: G03F7/039 ; G03F7/16
摘要:
A chemically amplified positive resist dry film to be formed on a support film contains 5-40 wt% of a component having a boiling point of 55-250°C under atmospheric pressure. The resist dry film having flexibility and dimensional stability can be prepared through simple steps. The resist dry film can be efficiently and briefly laid on an article and processed to form a pattern.
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