- 专利标题: PHOTOELECTRIC CONVERSION DEVICE AND MANUFACTURING METHOD THEREOF
- 专利标题(中): 黑社会大众传媒
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申请号: EP15180951.4申请日: 2009-10-24
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公开(公告)号: EP2996163A2公开(公告)日: 2016-03-16
- 发明人: OH, Min-Seok , KIM, Jung-Tae , SONG, Nam-Kyu , PARK, Min , LEE, Yun-Seok , LEE, Czang-Ho , SHIN, Myung-Hun , LEE, Byoung-Kyu , NAM, Yuk-Hyun , JUNG, Seung-Jae , LIM, Mi-Hwa , SEO, Joon-Young , CHOI, Dong , KIM, Dong-Seop , KIM, Byoung-June
- 申请人: Intellectual Keystone Technology LLC
- 申请人地址: 8180 Greensboro Drive, Suite 1070 McLean, VA 22102 US
- 专利权人: Intellectual Keystone Technology LLC
- 当前专利权人: Intellectual Keystone Technology LLC
- 当前专利权人地址: 8180 Greensboro Drive, Suite 1070 McLean, VA 22102 US
- 代理机构: Gulde & Partner
- 优先权: KR20080133646 20081224
- 主分类号: H01L31/072
- IPC分类号: H01L31/072 ; H01L31/0352 ; H01L31/0224 ; H01L31/18 ; H01L31/075 ; H01L31/0368 ; H01L31/0376 ; H01L31/0236
摘要:
Disclosed herein is a photoelectric conversion device having a semiconductor substrate including a front side and back side, a protective layer formed on the front side of the semiconductor substrate, a first non-single crystalline semiconductor layer formed on the back side of the semiconductor substrate, a first conductive layer including a first impurity formed on a first portion of a back side of the first non-single crystalline semiconductor layer, and a second conductive layer including the first impurity and a second impurity formed on a second portion of the back side of the first non-single crystalline semiconductor layer; and
a trench between the first conductive layer and the second conductive layer, wherein a portion of the first non-single crystalline semiconductor layer is exposed by the trench.
a trench between the first conductive layer and the second conductive layer, wherein a portion of the first non-single crystalline semiconductor layer is exposed by the trench.
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