发明授权
- 专利标题: SUPPORT TABLE FOR A LITHOGRAPHIC APPARATUS, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
- 专利标题(中): 光刻设备的支持表,光刻设备和设备制造方法
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申请号: EP14758149.0申请日: 2014-09-02
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公开(公告)号: EP3049869B1公开(公告)日: 2017-11-08
- 发明人: HOUBEN, Martijn , DE KOCK, Alwin , VAN ABEELEN, Hendrikus, Johannes, Marinus , VAN DEN HEUVEL, Marco, Adrianus, Peter
- 申请人: ASML Netherlands B.V.
- 申请人地址: P.O. Box 324 5500 AH Veldhoven NL
- 专利权人: ASML Netherlands B.V.
- 当前专利权人: ASML Netherlands B.V.
- 当前专利权人地址: P.O. Box 324 5500 AH Veldhoven NL
- 代理机构: Dung, Shiang-Lung
- 优先权: US201361883775P 20130927; US201361912383P 20131205
- 国际公布: WO2015043890 20150402
- 主分类号: G03F7/20
- IPC分类号: G03F7/20
摘要:
A support table to support a surface of a substrate, wherein the support table includes: a base surface substantially parallel to the surface of the substrate, a plurality of burls protruding above the base surface, each of the burls having a respective distal end and a first height above the base surface, the burls arranged such that, when the substrate is supported by the support table, the substrate is supported by the respective distal ends, and a plurality of elongate raised protrusions separated by gaps, each of the elongate raised protrusions having a second height above the base surface, wherein the elongate raised protrusions protrude above the base surface between the burls, and the second height is less than the first height; wherein the protrusions are arranged such that a plurality of the gaps are aligned to form a straight gas flow path towards an edge of the base surface.
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