发明公开
EP3152622A1 METHOD FOR COMPENSATING AN EXPOSURE ERROR IN AN EXPOSURE PROCESS
审中-公开
VERFAHREN ZUR KOMPENSATION EINES BELICHTUNGSFEHLERS IN EINEM BELICHTUNGSVERFAHREN
- 专利标题： METHOD FOR COMPENSATING AN EXPOSURE ERROR IN AN EXPOSURE PROCESS
- 专利标题（中）： VERFAHREN ZUR KOMPENSATION EINES BELICHTUNGSFEHLERS IN EINEM BELICHTUNGSVERFAHREN
-
申请号： EP15720652.5申请日： 2015-04-24
-
公开(公告)号： EP3152622A1公开(公告)日： 2017-04-12
- 发明人: BERENDSEN, Christianus Wilhelmus Johannes , BECKERS, Marcel , CASTELIJNS, Henricus Jozef , GERAETS, Hubertus Antonius , KOEVOETS, Adrianus Hendrik , LEVASIER, Leon Martin , SCHAAP, Peter , STREEFKERK, Bob , TROMP, Siegfried Alexander
- 申请人： ASML Netherlands B.V.
- 申请人地址： P.O. Box 324 5500 AH Veldhoven NL
- 专利权人： ASML Netherlands B.V.
- 当前专利权人： ASML Netherlands B.V.
- 当前专利权人地址： P.O. Box 324 5500 AH Veldhoven NL
- 代理机构： Filip, Diana
- 优先权： EP14170954 20140603; EP15161238 20150327
- 国际公布： WO2015185269 20151210
- 主分类号： G03F7/20
- IPC分类号： G03F7/20
摘要：
A method for compensating for an exposure error in an exposure process of a lithographic apparatus that comprises a substrate table, the method comprising: obtaining a dose measurement indicative of a dose of IR radiation that reaches substrate level, wherein the dose measurement can be used to calculate an amount of IR radiation absorbed by an object in the lithographic apparatus during an exposure process; and using the dose measurement to control the exposure process so as to compensate for an exposure error associated with the IR radiation absorbed by the object during the exposure process.
公开/授权文献
信息查询
IPC分类:
