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1.发明公开METHOD FOR COMPENSATING AN EXPOSURE ERROR IN AN EXPOSURE PROCESS 审中-公开VERFAHREN ZUR KOMPENSATION EINES BELICHTUNGSFEHLERS IN EINEM BELICHTUNGSVERFAHREN
公开(公告)号：EP3152622A1
公开(公告)日：2017-04-12
申请号：EP15720652.5
申请日：2015-04-24
发明人： BERENDSEN, Christianus Wilhelmus Johannes , BECKERS, Marcel , CASTELIJNS, Henricus Jozef , GERAETS, Hubertus Antonius , KOEVOETS, Adrianus Hendrik , LEVASIER, Leon Martin , SCHAAP, Peter , STREEFKERK, Bob , TROMP, Siegfried Alexander
IPC分类号： G03F7/20
CPC分类号： G03F7/70883 , G03F7/70033 , G03F7/70625 , G03F7/70783 , G03F7/70875 , G03F7/70891 , G03F7/70941
摘要： A method for compensating for an exposure error in an exposure process of a lithographic apparatus that comprises a substrate table, the method comprising: obtaining a dose measurement indicative of a dose of IR radiation that reaches substrate level, wherein the dose measurement can be used to calculate an amount of IR radiation absorbed by an object in the lithographic apparatus during an exposure process; and using the dose measurement to control the exposure process so as to compensate for an exposure error associated with the IR radiation absorbed by the object during the exposure process.
摘要翻译： 一种用于补偿包括衬底台的光刻设备的曝光过程中的曝光误差的方法，所述方法包括：获得表示达到衬底水平的IR辐射剂量的剂量测量，其中所述剂量测量可用于 计算在曝光过程中由光刻设备中的物体吸收的IR辐射的量; 并且使用剂量测量来控制曝光过程，以补偿在曝光过程期间由物体吸收的IR辐射相关的曝光误差。
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公开(公告)号：EP3210080B1
公开(公告)日：2020-12-09
申请号：EP15775219.7
申请日：2015-10-07
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公开(公告)号：EP3391149B1
公开(公告)日：2020-01-01
申请号：EP16791368.0
申请日：2016-11-02
发明人： NAKIBOGLU, Günes , BALTIS, Coen Hubertus Matheus , TROMP, Siegfried Alexander , VAN DE VIJVER, Yuri Johannes Gabriël , SCHOLTEN, Bert Dirk , VAN SOMMEREN, Daan Daniel Johannes Antonius , FRENCKEN, Mark Johannes Hermanus
IPC分类号： G03F7/20 , H01L21/683 , H01L21/687
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公开(公告)号：EP3455677A1
公开(公告)日：2019-03-20
申请号：EP17714816.0
申请日：2017-04-05
发明人： KRAMER, Gijs , HOUBEN, Martijn , WATERSON, Nicholas Peter , LAURENT, Thibault Simon Mathieu , VAN DE VIJVER, Yuri Johannes Gabriël , VERMEULEN, Marcus Martinus Petrus Adrianus , RAVENSBERGEN, Simon Karel , CLOOSTERMAN, Vincentius Fransiscus , TROMP, Siegfried Alexander , BALTIS, Coen Hubertus Matheus , GERRITZEN, Justin Johannes Hermanus , ROSET, Niek Jacobus Johannes
IPC分类号： G03F7/20
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公开(公告)号：EP3391149A1
公开(公告)日：2018-10-24
申请号：EP16791368.0
申请日：2016-11-02
发明人： NAKIBOGLU, Günes , BALTIS, Coen Hubertus Matheus , TROMP, Siegfried Alexander , VAN DE VIJVER, Yuri Johannes Gabriël , SCHOLTEN, Bert Dirk , VAN SOMMEREN, Daan Daniel Johannes Antonius , FRENCKEN, Mark Johannes Hermanus
IPC分类号： G03F7/20 , H01L21/683
摘要： A substrate holder (WT) for use in a lithographic apparatus and configured to support a substrate (W), the substrate holder comprising: • a main body (21) having a main body surface (22); • a plurality of burls (20) projecting from the main body surface to support the substrate spaced apart from the main body surface; and • a liquid control structure (200) provided in a peripheral region (22a) of the main body surface and configured to cause liquid to preferentially flow toward the periphery of the main body surface.
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6.发明公开SUPPORT TABLE FOR A LITHOGRAPHIC APPARATUS, METHOD OF LOADING A SUBSTRATE, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 审中-公开光刻设备的支撑台，加载基板的方法，光刻设备和设备制造方法
公开(公告)号：EP3210080A1
公开(公告)日：2017-08-30
申请号：EP15775219.7
申请日：2015-10-07
发明人： TROMP, Siegfried Alexander , VERWEIJ, Antonie Hendrik , SOETHOUDT, Abraham Alexander , VAN DE POEL, Jan Pieter , BAGGEN, Mark Constant Johannes
CPC分类号： F16C32/0611 , F16C29/025 , F16C32/0607 , G03F7/20 , G03F7/707 , G03F7/708
摘要： A support table, a method of loading a substrate, a lithographic apparatus and a method of manufacturing a device using a lithographic apparatus are disclosed. In one arrangement, a support table is configured to support a substrate. The support table has a base surface. The base surface faces a bottom surface of the substrate when the substrate is supported by the support table. One or more gas cushion members are provided above the base surface. Each of the gas cushion members includes a recess. The recess is shaped and configured such that a lowering of the substrate into a position on the support table at which the substrate is supported by the support table causes a localized build-up of pressure within the recess. The localized build-up of pressure provides a localized gas cushioning effect during the lowering of the substrate,
摘要翻译： 公开了用于光刻设备的支撑台，加载衬底的方法，光刻设备和使用光刻设备制造设备的方法。 在一种布置中，支撑台（100）被构造成支撑基板（W）。 支撑台包括基部表面（101）。 当基板由支撑台支撑时，基座表面面对基板的底表面（103）。 一个或多个气垫构件（102）设置在基部表面上方。 每个气垫元件包括凹槽（108）。 该凹部被成形和构造成使得基板降落到支撑台上的基板由支撑台支撑的位置处引起凹部内的局部压力积聚。 压力的局部积聚在降低基板期间提供了局部的气体缓冲作用。
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