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公开(公告)号：EP3449312A1
公开(公告)日：2019-03-06
申请号：EP17717149.3
申请日：2017-04-12
发明人： NASALEVICH, Maxim, Aleksandrovich , ABEGG, Erik, Achilles , BANERJEE, Nirupam , BLAUW, Michiel, Alexander , BROUNS, Derk, Servatius, Gertruda , JANSSEN, Paul , KRUIZINGA, Matthias , LENDERINK, Egbert , MAXIM, Nicolae , NIKIPELOV, Andrey , NOTENBOOM, Arnoud, Willem , PILIEGO, Claudia , PÉTER, Mária , RISPENS, Gijsbert , SCHUH, Nadja , VAN DE KERKHOF, Marcus, Adrianus , VAN DER ZANDE, Willem, Joan , VAN ZWOL, Pieter-Jan , VERBURG, Antonius, Willem , VERMEULEN, Johannes, Petrus, Martinus, Bernardus , VLES, David, Ferdinand , VOORTHUIJZEN, Willem-Pieter , ZDRAVKOV, Alexandar, Nikolov
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公开(公告)号：EP3391139A1
公开(公告)日：2018-10-24
申请号：EP16806058.0
申请日：2016-12-02
发明人： VLES, David, Ferdinand , ABEGG, Erik, Achilles , BENDIKSEN, Aage , BROUNS, Derk, Servatius, Gertruda , GOVIL, Pradeep K. , JANSSEN, Paul , NASALEVICH, Maxim, Aleksandrovich , NOTENBOOM, Arnoud, Willem , PÉTER, Mária , VAN DE KERKHOF, Marcus, Adrianus , VAN DER ZANDE, Willem, Joan , VAN ZWOL, Pieter-Jan , VERMEULEN, Johannes, Petrus, Martinus, Bernardus , VOORTHUIJZEN, Willem-Pieter , WILEY, James, Norman
CPC分类号： G03F1/64 , G03F1/22 , G03F1/62 , G03F7/7085 , G03F7/70916 , G03F7/70983
摘要： A pellicle suitable for use with a patterning device for a lithographic apparatus. The pellicle includes at least one breakage region which is configured to preferentially break, during normal use in a lithographic apparatus, prior to breakage of remaining regions of the pellicle.
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公开(公告)号：EP3391138A1
公开(公告)日：2018-10-24
申请号：EP16805430.2
申请日：2016-12-02
发明人： VAN ZWOL, Pieter-Jan , DE GRAAF, Dennis , JANSSEN, Paul , PÉTER, Mária , VAN DE KERKHOF, Marcus Adrianus , VAN DER ZANDE, Willem Joan , VLES, David Ferdinand , VOORTHUIJZEN, Willem-Pieter
CPC分类号： G03F1/24 , G03F1/62 , G03F7/70916 , G03F7/70983
摘要： A membrane for EUV lithography, the membrane having a thickness of no more than 200 nm and comprising a stack comprising: at least one silicon layer; and at least one silicon compound layer made of a compound of silicon and an element selected from the group consisting of boron, phosphorous, bromine
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公开(公告)号：EP3326032A1
公开(公告)日：2018-05-30
申请号：EP16734399.5
申请日：2016-07-04
CPC分类号： G03F1/64 , G03F1/142 , G03F1/62 , G03F1/66 , G03F7/70916
摘要： A method for manufacturing a membrane assembly for EUV lithography, the method including: providing a stack having a planar substrate and at least one membrane layer, wherein the planar substrate includes an inner region and a border region around the inner region; and selectively removing the inner region of the planar substrate. The membrane assembly includes: a membrane formed from the at least one membrane layer; and a border holding the membrane, the border formed from the border region of the planar substrate. The stack is provided with a mechanical protection material configured to mechanically protect the border region during the selectively removing the inner region of the planar substrate.
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公开(公告)号：EP3221748A2
公开(公告)日：2017-09-27
申请号：EP15794923.1
申请日：2015-11-16
发明人： VAN DER MEULEN, Frits , JANSEN, Maarten Mathijs Marinus , AZEREDO LIMA, Jorge Manuel , BROUNS, Derk Servatius Gertruda , BRUIJN, Marc , DEKKERS, Jeroen , JANSSEN, Paul , KRAMER, Ronald Harm Gunther , KRUIZINGA, Matthias , LANSBERGEN, Robert Gabriël Maria , LEENDERS, Martinus Hendrikus Antonius , LOOPSTRA, Erik Roelof , VAN DEN BOSCH, Gerrit , VAN LOO, Jérôme François Sylvain Virgile , VERBRUGGE, Beatrijs Louise Marie-Joseph Katrien , DE KLERK, Angelo Cesar Peter , DINGS, Jacobus Maria , JANSSEN, Maurice Leonardus Johannes , KERSTENS, Roland Jacobus Johannes , KESTERS, Martinus Jozef Maria , LOOS, Michel , MIDDEL, Geert , REIJNDERS, Silvester Matheus , THEUERZEIT, Frank Johannes Christiaan , VAN LIEVENOOGEN, Anne Johannes Wilhelmus
CPC分类号： G03F7/70983 , G03F1/64 , G03F7/70825
摘要： Tooling for a mask assembly suitable for use in a lithographic process, the mask assembly comprising a patterning device; and a pellicle frame configured to support a pellicle and mounted on the patterning device with a mount; wherein the mount provides a releasably engageable attachment between the patterning device and the pellicle frame.
摘要翻译： 用于适用于光刻工艺的掩模组件的工具，所述掩模组件包括图案形成装置; 以及被配置为支撑薄膜并用安装件安装在所述图案形成装置上的薄膜框架; 其中所述安装件在所述图案形成装置和所述薄膜框架之间提供可释放地接合的附接。
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6.发明公开MEMBRANES FOR USE WITHIN A LITHOGRAPHIC APPARATUS AND A LITHOGRAPHIC APPARATUS COMPRISING SUCH A MEMBRANE 审中-公开在光刻设备中使用的膜和包含该A膜的光刻设备
公开(公告)号：EP3164764A1
公开(公告)日：2017-05-10
申请号：EP15736224.5
申请日：2015-07-02
发明人： NIKIPELOV, Andrey, Alexandrovich , BANINE, Vadim, Yevgenyevich , BENSCHOP, Jozef, Petrus, Henricus , BOOGAARD, Arjen , DHALLUIN, Florian, Didier, Albin , KUZNETSOV, Alexey, Sergeevich , PÉTER, Mária , SCACCABAROZZI, Luigi , VAN DER ZANDE, Willem, Joan , VAN ZWOL, Pieter-Jan , YAKUNIN, Andrei, Mikhailovich
CPC分类号： G03F1/62 , G02B5/1838 , G02B5/208 , G03F1/24 , G03F1/38 , G03F7/70191 , G03F7/70316 , G03F7/70575 , G03F7/70891 , G03F7/70916 , G03F7/70958 , G03F7/70983
摘要： A membrane transmissive to EUV radiation, which may be used as a pellicle or spectral filter in a lithographic apparatus. The membrane includes one or more high doped regions wherein the membrane is doped with a dopant concentration greater than 1017 cm−3, and one or more regions with low (or no) doping. The membrane may have a main substrate having low doping and one or more additional layers, wherein the high doped regions are comprised within some or all of the additional layers.
摘要翻译： 公开了一种透射EUV辐射的膜，其可以用作光刻设备中的薄膜或光谱滤光片。 膜包括一个或多个高掺杂区，其中所述膜掺杂有大于1017cm -3的掺杂剂浓度，以及一个或多个掺杂区低（或不掺杂）的区。 膜可以具有低掺杂的主基板和一个或多个附加层，其中所述高掺杂区包含在所述附加层的一些或全部内。
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公开(公告)号：EP3696605A1
公开(公告)日：2020-08-19
申请号：EP19156895.5
申请日：2019-02-13
IPC分类号： G03F7/20
摘要： The present invention provides an apparatus comprising a projection system having an optical axis and configured to project a radiation beam. The apparatus comprises a measurement unit arranged to measure the radiation beam projected by the projection system, the measurement unit comprising an opening through which the radiation beam passes in use, and a sensing surface extending transverse to the optical axis and arranged to measure the radiation beam passing through the opening. The lithographic apparatus is configured to move the sensing surface in a plane transverse to the optical axis between a plurality of measurement positions. The radiation beam defines a view in said plane, and the measurement unit is configured such that the sensing surface captures, in each measurement position, a portion of the view smaller than 100% of the view. The present invention comprises a corresponding method.
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公开(公告)号：EP3371655A1
公开(公告)日：2018-09-12
申请号：EP16785484.3
申请日：2016-10-25
CPC分类号： G03F7/70983 , B82Y40/00 , G03F1/24 , G03F1/62 , G03F1/64 , G03F7/70916 , G03F7/70958 , G21K2201/067
摘要： A method for manufacturing a membrane assembly for EUV lithography, the method including: providing a stack including a membrane layer between a supporting substrate and an attachment substrate, wherein the supporting substrate includes an inner region and a border region; processing the stack, including selectively removing the inner region of the supporting substrate, to form a membrane assembly comprising: a membrane formed from at least the membrane layer; and a support holding the membrane, the support formed at least partially from the border region of the supporting substrate. The attachment substrate can be bonded to the rest of the stack.
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公开(公告)号：EP3254157A2
公开(公告)日：2017-12-13
申请号：EP16702142.7
申请日：2016-02-01
发明人： BROUNS, Derk Servatius Gertruda , DE GRAAF, Dennis , DE KRUIF, Robertus Cornelis Martinus , JANSSEN, Paul , KRUIZINGA, Matthias , NOTENBOOM, Arnoud Willem , SMITH, Daniel Andrew , VERBRUGGE, Beatrijs Louise Marie-Joseph Katrien , WILEY, James Norman
摘要： A method comprising the steps of receiving a mask assembly comprising a mask and a removable EUV transparent pellicle held by a pellicle frame, removing the pellicle frame and EUV transparent pellicle from the mask, using an inspection tool to inspect the mask pattern on the mask, and subsequently attaching to the mask an EUV transparent pellicle held by a pellicle frame. The method may also comprise the following steps: after removing the pellicle frame and EUV transparent pellicle from the mask, attaching to the mask an alternative pellicle frame holding an alternative pellicle formed from a material which is substantially transparent to an inspection beam of the inspection tool; and after using an inspection tool to inspect the mask pattern on the mask, removing the alternative pellicle held by the alternative pellicle frame from the mask in order to attach to the mask the EUV transparent pellicle held by the pellicle frame.
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公开(公告)号：EP3365730A2
公开(公告)日：2018-08-29
申请号：EP16788043.4
申请日：2016-10-11
发明人： PÉTER, Mária , ABEGG, Erik Achilles , GIESBERS, Adrianus Johannes Maria , KLOOTWIJK, Johan Hendrik , NASALEVICH, Maxim Aleksandrovich , VAN DEN EINDEN, Wilhelmus Theodorus Anthonius Johannes , VAN DER ZANDE, Willem Joan , VAN ZWOL, Pieter-Jan , VERMEULEN, Johannes Petrus Martinus Bernardus , VLES, David, Ferdinand , VOORTHUIJZEN, Willem-Pieter
CPC分类号： G03F7/70958 , G03F1/62 , G03F7/70983 , G21K2201/067
摘要： Methods of manufacturing a pellicle for a lithographic apparatus are disclosed. In one arrangement the method comprises depositing at least one graphene layer on a planar surface of a substrate. The substrate comprises a first substrate portion and a second substrate portion. The method further comprises removing the first substrate portion to form a freestanding membrane from the at least one graphene layer. The freestanding membrane is supported by the second substrate portion.
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