发明公开
EP3155481A1 LITHOGRAPHIC APPARATUS AND METHOD OF MANUFACTURING A LITHOGRAPHIC APPARATUS
审中-公开
LITHOGRAFISCHE VORRICHTUNG VERFAHREN ZUR HERSTELLUNG EINER LITHOGRAFISCHEN VORRICHTUNG
- 专利标题： LITHOGRAPHIC APPARATUS AND METHOD OF MANUFACTURING A LITHOGRAPHIC APPARATUS
- 专利标题（中）： LITHOGRAFISCHE VORRICHTUNG VERFAHREN ZUR HERSTELLUNG EINER LITHOGRAFISCHEN VORRICHTUNG
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申请号： EP15721224.2申请日： 2015-05-07
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公开(公告)号： EP3155481A1公开(公告)日： 2017-04-19
- 发明人: CORTIE, Rogier, Hendrikus, Magdalena , BERENDSEN, Christianus, Wilhelmus, Johannes , JEUNINK, Andre, Bernardus , KOEVOETS, Adrianus, Hendrik , OVERKAMP, Jim, Vincent , TROMP, Siegfried, Alexander , VY, Van, Vuong , AUDENAERDT, Daniel, Elza, Roeland
- 申请人： ASML Netherlands B.V.
- 申请人地址： P.O. Box 324 5500 AH Veldhoven NL
- 专利权人： ASML Netherlands B.V.
- 当前专利权人： ASML Netherlands B.V.
- 当前专利权人地址： P.O. Box 324 5500 AH Veldhoven NL
- 代理机构： Dung, Shiang-Lung
- 优先权： EP14171800 20140610; EP15159551 20150318
- 国际公布： WO2015188988 20151217
- 主分类号： G03F7/20
- IPC分类号： G03F7/20
摘要：
A lithographic apparatus comprising: a channel (46) for the passage therethrough of a two phase flow, wherein the channel is formed within a block, the block being of a first material (100); a second material (160) between the first material and the channel, wherein the second material has a specific heat capacity higher than that of the first material; and a third material (90) between the second material and the channel, wherein the third material has a thermal conductivity higher than that of the second material.
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