发明公开
- 专利标题: PHOTOSENSITIVE COMPOSITION AND COMPOUND
- 专利标题(中): 光敏组合物和化合物
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申请号: EP15822097.0申请日: 2015-07-14
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公开(公告)号: EP3165965A1公开(公告)日: 2017-05-10
- 发明人: TADOKORO, Yoshinori , SHIOTA, Dai
- 申请人: Tokyo Ohka Kogyo Co., Ltd.
- 申请人地址: 150, Nakamaruko Nakahara-ku Kawasaki-shi, Kanagawa 211-0012 JP
- 专利权人: Tokyo Ohka Kogyo Co., Ltd.
- 当前专利权人: Tokyo Ohka Kogyo Co., Ltd.
- 当前专利权人地址: 150, Nakamaruko Nakahara-ku Kawasaki-shi, Kanagawa 211-0012 JP
- 代理机构: Cabinet Plasseraud
- 优先权: JP2014145257 20140715; JP2014209470 20141010; JP2015126581 20150624
- 国际公布: WO2016010036 20160121
- 主分类号: G03F7/031
- IPC分类号: G03F7/031 ; C08F2/48 ; G02B5/20 ; G02F1/1333 ; G02F1/1335 ; G03F7/004
摘要:
The purpose of the present invention is to provide a photosensitive composition having excellent sensitivity, an insulating film formed using said photosensitive composition, a color filter formed using said photosensitive composition, a display device provided with said insulating film or said color filter, and a compound suitable for incorporation as a photopolymerization initiator into said photosensitive composition. This photosensitive composition includes (A) a photopolymerizable compound and (B) a photopolymerization initiator, wherein the photopolymerization initiator (B) contains a compound represented by formula (1). In formula (1), R 1 is a hydrogen atom, a nitro group, or a monovalent organic group; R 2 and R 3 are each an optionally substituted linear alkyl group, an optionally substituted cyclic organic group, or a hydrogen atom, and R 2 and R 3 may be bonded to one another to form a ring; R 4 is a monovalent organic group; R 5 is a hydrogen atom, an optionally substituted C1-11 alkyl group, or an optionally substituted aryl group; n is an integer from 0 to 4; and m is 0 or 1.
公开/授权文献
- EP3165965B1 PHOTOSENSITIVE COMPOSITION AND COMPOUND 公开/授权日:2018-10-10
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