CURABLE COMPOSITION
    3.
    发明公开
    CURABLE COMPOSITION 审中-公开
    可固化组合物

    公开(公告)号:EP3228641A1

    公开(公告)日:2017-10-11

    申请号:EP15867367.3

    申请日:2015-12-08

    IPC分类号: C08G59/50 C08G59/42 C08J5/04

    摘要: Provided are: a curable composition that can be cured at low temperature in a short time regardless of the type of epoxy compound that is mixed therewith, and has a long pot life; an adhesive comprising said curable composition; a method for producing a fiber-reinforced composite material that uses the curable composition; and a fiber-reinforced composite material containing a matrix comprising the curable composition. Furthermore, the present invention provides a curing agent mixture composition that can be cured at low temperature and in a short time, and provides the curable composition with a long pot life. Furthermore, provided is a curing agent mixture composition that can be cured at low temperature and in a short time, and provides the curable composition with a long pot life. An epoxy compound (A) and an imidazole compound (B) having a specific structure are blended in with the curable composition. In addition, the imidazole compound (B) having a specific structure and at least one type of crosslinking agent (C) selected from the group comprising a polyvalent amide compound and a polyvalent carboxylic acid anhydride are blended in with the curing agent mixture composition.

    摘要翻译: 本发明提供一种无论混入的环氧化合物的种类如何,都能够在短时间内在低温下进行固化,且适用期长的固化性组合物, 包含所述可固化组合物的粘合剂 生产使用该可固化组合物的纤维增强复合材料的方法; 以及含有包含该固化性组合物的基质的纤维增强复合材料。 此外,本发明提供了一种固化剂混合物组合物,其能够在低温下和短时间内固化,并且为可固化组合物提供了较长的适用期。 此外,提供了一种固化剂混合物组合物,其能够在低温下和短时间内固化,并且为可固化组合物提供了较长的适用期。 具有特定结构的环氧化合物(A)和咪唑化合物(B)与可固化组合物共混。 另外,具有特定结构的咪唑化合物(B)和选自多价酰胺化合物和多价羧酸酐中的至少一种交联剂(C)与固化剂混合物组合物共混。

    NOVEL COMPOUND
    4.
    发明公开
    NOVEL COMPOUND 审中-公开
    新的化合物

    公开(公告)号:EP2725011A1

    公开(公告)日:2014-04-30

    申请号:EP12801908.0

    申请日:2012-06-15

    摘要: Provided is a novel compound suitable for obtaining a negative-type photosensitive resin composition capable of forming a pattern having favorable adhesiveness at a low light exposure. The compound according to the present invention is represented by the following formula (1). In the formula, R 1 and R 2 each independently indicate a hydrogen atom or an organic group, but at least one indicates an organic group. R 1 and R 2 may be bonded to form a ring structure and may contain a hetero atom bond. R 3 indicates a single bond or an organic group. R 4 to R 9 each independently indicate a hydrogen atom, an organic group, etc., but R 6 and R 7 are never hydroxyl groups. R 10 indicates a hydrogen atom or an organic group.

    摘要翻译: 本发明提供一种适于获得能够在低曝光量下形成具有良好粘合性的图案的负型感光性树脂组合物的新型化合物。 根据本发明的化合物由下式(1)表示。 在该式中,R1和R2各自独立地表示氢原子或有机基团,但至少一个表示有机基团。 R1和R2可以键合形成环结构并可以含有杂原子键。 R3表示单键或有机基团。 R 4至R 9各自独立地表示氢原子,有机基团等,但R 6和R 7不是羟基。 R10表示氢原子或有机基团。

    PHOTOSENSITIVE COMPOSITION AND COMPOUND
    5.
    发明公开
    PHOTOSENSITIVE COMPOSITION AND COMPOUND 审中-公开
    光敏组合物和化合物

    公开(公告)号:EP3165965A1

    公开(公告)日:2017-05-10

    申请号:EP15822097.0

    申请日:2015-07-14

    摘要: The purpose of the present invention is to provide a photosensitive composition having excellent sensitivity, an insulating film formed using said photosensitive composition, a color filter formed using said photosensitive composition, a display device provided with said insulating film or said color filter, and a compound suitable for incorporation as a photopolymerization initiator into said photosensitive composition. This photosensitive composition includes (A) a photopolymerizable compound and (B) a photopolymerization initiator, wherein the photopolymerization initiator (B) contains a compound represented by formula (1). In formula (1), R 1 is a hydrogen atom, a nitro group, or a monovalent organic group; R 2 and R 3 are each an optionally substituted linear alkyl group, an optionally substituted cyclic organic group, or a hydrogen atom, and R 2 and R 3 may be bonded to one another to form a ring; R 4 is a monovalent organic group; R 5 is a hydrogen atom, an optionally substituted C1-11 alkyl group, or an optionally substituted aryl group; n is an integer from 0 to 4; and m is 0 or 1.

    摘要翻译: 本发明的目的在于提供一种感光性优异的感光性组合物,使用该感光性组合物形成的绝缘膜,使用该感光性组合物形成的滤色器,具备该绝缘膜或滤色片的显示装置, 适合作为光聚合引发剂掺入所述光敏组合物中。 该感光性组合物含有(A)光聚合性化合物和(B)光聚合引发剂,其中光聚合引发剂(B)含有式(1)所示的化合物。 式(1)中,R 1为氢原子,硝基或1价有机基团。 R2和R3各自为任选取代的直链烷基,任选取代的环状有机基团或氢原子,并且R2和R3可以彼此结合形成环; R4是一价有机基团; R5是氢原子,任选取代的C1-11烷基或任选取代的芳基; n是0至4的整数; 并且m是0或1。

    NEGATIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION, PATTERN FORMING METHOD, CURED FILM, INSULATING FILM, COLOR FILTER, AND DISPLAY DEVICE
    6.
    发明公开
    NEGATIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION, PATTERN FORMING METHOD, CURED FILM, INSULATING FILM, COLOR FILTER, AND DISPLAY DEVICE 审中-公开
    负光敏树脂组成,结构形成方法,硬化膜,绝缘,滤色器和显示装置

    公开(公告)号:EP2725423A1

    公开(公告)日:2014-04-30

    申请号:EP12803395.8

    申请日:2012-06-15

    摘要: Provided are: a negative-type photosensitive resin composition capable of forming a pattern having favorable adhesiveness at a low light exposure; a pattern forming method using the negative-type photosensitive resin composition; a cured film, an insulating film, and a color filter formed using the negative-type photosensitive resin composition; and a display device provided with the cured film, insulating film, or color filter. The negative-type photosensitive resin composition according to the present invention contains a compound represented by the following formula (1). In the formula, R 1 and R 2 each independently indicate a hydrogen atom or an organic group, but at least one indicates an organic group. R 1 and R 2 may be bonded to form a ring structure and may contain a hetero atom bond. R 3 indicates a single bond or an organic group. R 4 to R 9 each independently indicate a hydrogen atom, an organic group, etc., but R 6 and R 7 are never hydroxyl groups. R 10 indicates a hydrogen atom or an organic group.

    摘要翻译: 本发明提供:能够形成具有在低曝光量密合性优异的图案的负型感光性树脂组合物; 使用该负型感光性树脂组合物的图案形成方法; 的固化膜,在绝缘电影,和滤色器使用该负型感光性树脂组合物形成; 和设置有该固化电影,绝缘电影,或滤色器的显示装置。 负型感光性树脂组合物gemäß到本发明含有下式(1)表示的化合物。 在该式中,R 1和R 2各自unabhängig表示氢原子或有机基团,但表示的有机基团中的至少一个。 R 1和R 2可以键合而形成环结构,并且可以包含杂原子的键。 ,R 3表示单键或有机基团。 R 4至R 9各自独立地表示氢原子的有机基团等,但R 6和R 7不为羟基。 -R 10表示氢原子或有机基团。