发明公开
- 专利标题: SEMICONDUCTOR MANUFACTURING DEVICE, AND METHOD OF MANUFACTURING SEMICONDUCTOR
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申请号: EP15824999申请日: 2015-07-08
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公开(公告)号: EP3174089A4公开(公告)日: 2017-11-15
- 发明人: FUJIKURA HAJIME , KONNO TAICHIRO , NONAKA TAKEHIRO , NUMATA TAKAYUKI
- 申请人: SUMITOMO CHEMICAL CO
- 专利权人: SUMITOMO CHEMICAL CO
- 当前专利权人: SUMITOMO CHEMICAL CO
- 优先权: JP2014148961 2014-07-22
- 主分类号: H01L21/677
- IPC分类号: H01L21/677 ; B65G49/07 ; C23C16/44 ; C23C16/46 ; H01L21/205 ; H01L21/67
摘要:
Techniques are provided to improve the quality of the thin films deposited on substrates. A substrate transporting mechanism is configured to transport a plurality of substrates arranged in a line along a transport path extending in a first container from an entrance to an exit, and to load and unload substrates into and out of a second container in order. The driving units to drive the substrate transporting mechanism are configured to be detachable from the substrate transporting mechanism provided in the first container and are respectively provided in a substrate loading chamber and a substrate unloading chamber.
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