发明公开
EP3179308A1 UNDERLAYER FILM-FORMING COMPOSITION FOR LITHOGRAPHY, UNDERLAYER FILM FOR LITHOGRAPHY, AND PATTERN FORMING METHOD
审中-公开
下层膜的组合物的光刻，下层膜的光刻和方法成形结构
- 专利标题： UNDERLAYER FILM-FORMING COMPOSITION FOR LITHOGRAPHY, UNDERLAYER FILM FOR LITHOGRAPHY, AND PATTERN FORMING METHOD
- 专利标题（中）： 下层膜的组合物的光刻，下层膜的光刻和方法成形结构
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申请号： EP15829358.9申请日： 2015-07-31
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公开(公告)号： EP3179308A1公开(公告)日： 2017-06-14
- 发明人: OKADA, Kana , MAKINOSHIMA, Takashi , ECHIGO, Masatoshi , HIGASHIHARA, Go , OKOSHI, Atsushi
- 申请人： Mitsubishi Gas Chemical Company, Inc.
- 申请人地址： 5-2, Marunouchi 2-chome Chiyoda-ku Tokyo 100-8324 JP
- 专利权人： Mitsubishi Gas Chemical Company, Inc.
- 当前专利权人： Mitsubishi Gas Chemical Company, Inc.
- 当前专利权人地址： 5-2, Marunouchi 2-chome Chiyoda-ku Tokyo 100-8324 JP
- 代理机构： Müller-Boré & Partner Patentanwälte PartG mbB
- 优先权： JP2014162535 20140808
- 国际公布： WO2016021511 20160211
- 主分类号： G03F7/11
- IPC分类号： G03F7/11 ; C07C261/02 ; G03F7/004 ; G03F7/26 ; H01L21/027
摘要：
The composition for forming an underlayer film for lithography according to the present invention contains a compound represented by a specific formula (1) and 20 to 99% by mass of a solvent component (S), in which 27 to 100% by mass of the compound represented by the formula (1) is included in a component (A) other than the solvent component (S).
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