- 专利标题: MAGNETIC TUNNEL JUNCTION (MTJ) INTEGRATION ON BACKSIDE OF SILICON
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申请号: EP19175812.7申请日: 2019-05-21
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公开(公告)号: EP3588502A3公开(公告)日: 2020-03-25
- 发明人: MANIPATRUNI, Sasikanth , GOSAVI, Tanay , YOUNG, Ian , NIKONOV, Dmitri
- 申请人: Intel Corporation
- 申请人地址: 2200 Mission College Boulevard Santa Clara, CA 95054 US
- 专利权人: Intel Corporation
- 当前专利权人: Intel Corporation
- 当前专利权人地址: 2200 Mission College Boulevard Santa Clara, CA 95054 US
- 代理机构: Goddar, Heinz J.
- 优先权: US201816022519 20180628
- 主分类号: G11C11/16
- IPC分类号: G11C11/16 ; H01L21/768 ; H01L27/06 ; H01L27/22
摘要:
A memory device comprises a substrate having a front side and a backside, wherein a first conductive line is on the backside and a second conductive line is on the front side. A transistor is on the front side between the second conductive line and the substrate. A magnetic tunnel junction (MTJ) is on the backside between the first conductive line and the substrate, wherein one end of the MTJ is coupled through the substrate to the transistor and an opposite end of the MTJ is connected to the first conductive line, and wherein the transistor is further connected to the second conductive line on the front side.
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