- 专利标题: SOLID-STATE IMAGING ELEMENT, SOLID-STATE IMAGING DEVICE, AND METHOD FOR MANUFACTURING SOLID-STATE IMAGING ELEMENT
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申请号: EP19841222.3申请日: 2019-07-23
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公开(公告)号: EP3828935A1公开(公告)日: 2021-06-02
- 发明人: FUKUOKA, Shinpei , TAKEO, Moe , NISHIDA, Sho , TOGASHI, Hideaki , SHIGETOSHI, Takushi , YAMAMOTO, Junpei
- 申请人: Sony Corporation , Sony Semiconductor Solutions Corporation
- 申请人地址: JP 108-0075 Tokyo 1-7-1 Konan Minato-ku; JP Atsugi-shi, Kanagawa 243-0014 4-14-1 Asahi-cho
- 代理机构: Müller Hoffmann & Partner
- 优先权: JP2018140151 20180726
- 国际公布: WO2020022349 20200130
- 主分类号: H01L27/146
- IPC分类号: H01L27/146 ; H01L21/3205 ; H01L21/768 ; H01L23/522 ; H04N5/369
摘要:
A solid-state image sensor (100) is provided that includes a semiconductor substrate (500), a charge accumulator disposed in the semiconductor substrate (500) and configured to accumulate charge, a photoelectric converter (200) provided above the semiconductor substrate (500) and configured to convert light to charge, and a through electrode (600) passing through the semiconductor substrate (500) and electrically connecting the charge accumulator with the photoelectric converter (200). At an end portion on the photoelectric converter side of the through electrode (600), a cross-sectional area of a conductor (602) positioned at the center of the through electrode (600) in a cut section orthogonal to a through direction of the through electrode (600) gradually increases toward the photoelectric converter along the through direction.
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