- 专利标题： LIGHT IRRADIATION DEVICE, AND EXPOSURE APPARATUS PROVIDED THEREWITH
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申请号： EP21776652.6申请日： 2021-03-17
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公开(公告)号： EP4130862A1公开(公告)日： 2023-02-08
- 发明人: INOUE, Tomohiko , YAMASHITA, Kenichi , MATSUMOTO, Hiromu , IKEDA, Tomihiko
- 申请人： Phoenix Electric Co., Ltd.
- 申请人地址： JP Himeji-shi, Hyogo 679-2122 Mikage 703, Toyotomi-cho
- 代理机构： Horn Kleimann Waitzhofer Patentanwälte PartG mbB
- 优先权： JP2020053452 20200324
- 国际公布： WO2021193301 20210930
- 主分类号： G02F1/1337
- IPC分类号： G02F1/1337
摘要：
To provide a light irradiation device for an exposure apparatus allowing implementation of photo-alignment process with a simple configuration.
A light irradiation device 10 is configured using a light source 12 with a plurality of LEDs 16, and a polarizing element 14 that receives light L from the light source 12 and applies the light L transmitted through the polarizing element 14 to a workpiece X. An optical axis CL of each of the LEDs 16 is set in such a manner as to have a first angle θ1 to the workpiece X. A second angle θ2 as an angle half of a light distribution angle of the light L emitted from each of the LEDs 16 is set smaller than the first angle θ1.
A light irradiation device 10 is configured using a light source 12 with a plurality of LEDs 16, and a polarizing element 14 that receives light L from the light source 12 and applies the light L transmitted through the polarizing element 14 to a workpiece X. An optical axis CL of each of the LEDs 16 is set in such a manner as to have a first angle θ1 to the workpiece X. A second angle θ2 as an angle half of a light distribution angle of the light L emitted from each of the LEDs 16 is set smaller than the first angle θ1.
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