- 专利标题: USE OF SILYL BRIDGED ALKYL COMPOUNDS FOR DENSE OSG FILMS
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申请号: EP23213346.2申请日: 2017-10-26
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公开(公告)号: EP4307343A3公开(公告)日: 2024-03-27
- 发明人: VRTIS, Raymond Nicholas , RIDGEWAY, Robert Gordon , ACHTYL, Jennifer Lynn Anne , ENTLEY, William Robert , SINATORE, Dino , THEODOROU, Kathleen Esther , ADAMCZYK, Andrew, J.
- 申请人: Versum Materials US, LLC
- 申请人地址: US Tempe, AZ 85284 8555 S. River Parkway
- 代理机构: Beck Greener LLP
- 优先权: US201715789790 20171020
- 主分类号: H01L21/02
- IPC分类号: H01L21/02 ; C23C16/40 ; C23C16/505 ; C23C16/56
摘要:
Low dielectric materials and films comprising same have been identified for improved performance when used as interlevel dielectrics in integrated circuits as well as methods for making same.
公开/授权文献
- EP4307343A2 USE OF SILYL BRIDGED ALKYL COMPOUNDS FOR DENSE OSG FILMS 公开/授权日:2024-01-17
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