- 专利标题： PELLICLE FRAME, PELLICLE, PHOTOMASK WITH PELLICLE, EXPOSURE METHOD, METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE, AND METHOD FOR MANUFACTURING LIQUID CRYSTAL DISPLAY
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申请号： EP22784593.0申请日： 2022-03-30
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公开(公告)号： EP4321931A1公开(公告)日： 2024-02-14
- 发明人: NISHIMURA, Akinori
- 申请人： SHIN-ETSU CHEMICAL CO., LTD.
- 申请人地址： JP Tokyo 1000005 4-1, Marunouchi 1 chome, Chiyoda-ku,
- 代理机构： Meissner Bolte Partnerschaft mbB
- 优先权： JP2021064107 20210405
- 国际公布： WO2022215609 20221013
- 主分类号： G03F1/64
- IPC分类号： G03F1/64 ; C09J7/38
摘要：
The purpose of the present invention is to provide a pellicle frame with an adhesive layer with which it is possible to prevent deterioration in the flatness of the adhesive layer more effectively than before, further to moderate the stress applied by a pellicle to a photomask, and as a result to reduce pellicle induced distortion (PID). The present invention provides a pellicle frame with an adhesive layer having one end surface on which a pellicle film is provided and another end surface provided with an adhesive layer for adhesion to a photomask, wherein the adhesive layer has a thickness of 0.10 to 0.30 mm, and the adhesive layer has an adhesive force of 5×10 -3 to 5×10 -1 N/cm. The present invention also provides a pellicle provided with a pellicle film on the one end surface.
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